INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTURING DEVICES USING THE SYSTEM

• US 20120032079A1
• Filed: 09/23/2011
• Published: 02/09/2012
• Est. Priority Date: 06/27/2000
• Status: Active Grant

• Current Assignee: Toshiba Memory Corporation (Kioxia Corporation)
• Original Assignee: Ebara Corporation, Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: Nakasuji, Mamoru, Noji, Nobuharu, Satake, Tohru, Hatakeyama, Masahiro, Kimba, Toshifumi, Sobukawa, Hirosi, Yoshikawa, Shoji, Murakami, Takeshi, Watanabe, Kenji, Karimata, Tsutomu, Oowada, Shin, Saito, Mutsumi, Yamazaki, Yuichiro, Nagai, Takamitsu, Nagahama, Ichirota
• Granted Patent: US 8,368,031 B2
• Time in Patent Office: Days
• US Class Current: 250/310
• CPC Class Codes: G01N 23/225 using electron or ion
• CPC Class Codes: G01N 23/2251 using incident electron beams, e.g. scanning electron microscopy [SEM]
• CPC Class Codes: G01N 23/227 Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
• CPC Class Codes: H01J 2237/082 Electron beam
• CPC Class Codes: H01J 2237/202 Movement
• CPC Class Codes: H01J 2237/20228 Mechanical X-Y scanning
• CPC Class Codes: H01J 2237/204 Means for introducing and/or outputting objects locks H01J2237/184
• CPC Class Codes: H01J 2237/22 Treatment of data mixing signals H01J2237/24495
• CPC Class Codes: H01J 2237/24564 Measurements of electric or magnetic variables, e.g. voltage, current, frequency
• CPC Class Codes: H01J 2237/2806 Secondary charged particle
• CPC Class Codes: H01J 2237/2816 Length
• CPC Class Codes: H01J 2237/2817 Pattern inspection
• CPC Class Codes: H01J 29/70 Arrangements for deflecting ray or beam H01J29/467, H01J29/525 take precedence
• CPC Class Codes: H01J 37/06 Electron sources; Electron guns electron sources in general H01J1/02, H01J19/02; electron guns in general H01J3/02
• CPC Class Codes: H01J 37/073 Electron guns using field emission, photo emission, or secondary emission electron sources
• CPC Class Codes: H01J 37/141 Electromagnetic lenses
• CPC Class Codes: H01J 37/185 Means for transferring objects between different enclosures of different pressure or atmosphere
• CPC Class Codes: H01J 37/20 Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support introducing the objects H01J37/18
• CPC Class Codes: H01J 37/222 Image processing arrangements associated with the tube image data processing or generation, in general G06T
• CPC Class Codes: H01J 37/244 Detectors; Associated components or circuits therefor
• CPC Class Codes: H01J 37/266 : Measurement of magnetic- or electric fields in the object; Lorentzmicroscopy emission microscopes H01J37/285; reflecting microscopes H01J37/29; spot analysing H01J37/252
• CPC Class Codes: H01J 37/28 : with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence
• CPC Class Codes: H01L 21/6719 : characterized by the construction of the processing chambers, e.g. modular processing chambers
• CPC Class Codes: H01L 21/67213 : comprising at least one ion or electron beam chamber coating by ion implantation C23C; ion or electron beam tubes H01J37/00

Abstract

An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

Claims

1. An E×

B separator, into which a first charged particle beam and a second charged particle beam enter, said second charged particles being advanced in a direction approximately opposite to said first charged particle beam, and in which said first charged particle beam or said second charged particle beam is deflected selectively, said E×

B separator characterized in that;

electrodes for generating an electric field are made up of three or more pairs of non-magnetic conductive electrodes, and are arranged so as to form a cylinder.

2. An E×

B separator in accordance with claim 1, in which each of pair of parallel plate magnetic poles for generating a magnetic field is respectively arranged outside of said cylinder composed of said three or more pairs of non-magnetic conductive electrodes, and projections are formed in peripheral portions of the opposite face of each of said pair of parallel plate magnetic poles.

3. An E×

B separator in accordance with claim 2, in which in a passage space of lines of magnetic force of the magnetic field generated, a majority of the passage space other than that between said parallel plate magnetic poles is formed to be cylindrical in shape and coaxial with said cylinder composed of said three or more pairs of non-magnetic conductive electrodes.

4. An E×

B separator in accordance with claim 2 or 3, in which said parallel plate magnetic poles are made of permanent magnets.

5. A defect inspection apparatus using the E×

B separator defined by any of claims 1 to 4, in which

either one of said first charged particle beam or said second charged particle beam is a primary charged particle beam to be irradiated against a sample to be inspected, and the other is a secondary charged particle beam generated from said sample by the irradiation of said primary charged particle beam.