HIGHLY SENSITIVE CAPACITIVE SENSOR AND METHODS OF MANUFACTURING THE SAME

• US 20120048019A1
• Filed: 08/26/2010
• Published: 03/01/2012
• Est. Priority Date: 08/26/2010
• Status: Abandoned Application

• Current Assignee: Memsic Incorporated (MZ Investment Holdings Ltd.)
• Original Assignee: Memsic Incorporated (MZ Investment Holdings Ltd.)
• Inventors: Jiang, Leyue, Varghese, Mathew, Liu, Haidong, Zhou, Hanqin
• Application Number:
  US12/869,222
• Publication Number:
  US 20120048019A1
• Time in Patent Office: Days
• US Class Current: 73/514.32
• CPC Class Codes: G01P 15/125 by capacitive pick-up
• CPC Class Codes: G01P 2015/0814 for translational movement of the mass, e.g. shuttle type

Abstract

Micro-machined capacitive sensors implemented in micro-electro-mechanical system (MEMS) processes that have higher sensitivity, while providing an increased linear capacitive sensing range. Capacitive sensing is achieved via variable-area sensing, which employs a transduction mechanism in which the relationship between changes in the capacitance of variable, parallel-plate capacitors and displacements of a proof mass is generally linear. Each respective variable, parallel-plate capacitor is formed by a finger/electrode pair, in which both the finger and the electrode have rectangular tooth profiles that include a plurality of rectangular teeth. Because changes in the overlapping area of the finger and the electrode are multiplied by the number of rectangular teeth, while the standing capacity of the micro-machined capacitive sensor remains relatively high, the sensitivity of the micro-machined capacitive sensor employing variable-area sensing is significantly increased per unit area of the finger and the electrode.

Claims

1. A capacitive sensor, comprising:

a substrate;

a mass;

a plurality of spring beams coupling the mass to the substrate;

at least one first electrode extending from the mass; and

at least one second electrode attached to the substrate,

wherein the first electrode is disposed adjacent to the second electrode to form a substantially invariable gap between the first and second electrodes, and

wherein each of the first and second electrodes has a tooth profile including a plurality of teeth, each of the plurality of teeth having a predetermined geometric shape.

2. The capacitive sensor of claim 1 wherein the predetermined geometric shape of the respective teeth includes a substantially rectangular shape.

3. The capacitive sensor of claim 1 wherein the predetermined geometric shape of the respective teeth includes a substantially square shape.

4. The capacitive sensor of claim 1 wherein the predetermined geometric shape of the respective teeth includes a substantially rounded shape.

5. The capacitive sensor of claim 1 further including a dielectric material disposed in the substantially invariable gap between the first and second electrodes, and wherein the first electrode, the second electrode, and the dielectric material disposed in the substantially invariable gap between the first and second electrodes form a parallel-plate capacitor.

6. The capacitive sensor of claim 5 wherein the parallel-plate capacitor has an associated capacitance, wherein the first electrode disposed adjacent to the second electrode defines an overlapping area of the first and second electrodes, and wherein the capacitance of the parallel-plate capacitor changes in response to a displacement of the mass, thereby causing a corresponding change in the overlapping area of the first and second electrodes.

7. The capacitive sensor of claim 1 wherein the plurality of teeth of the tooth profile includes at least two teeth.

8. The capacitive sensor of claim 1 wherein the at least one first electrode extending from the mass includes a plurality of first electrodes extending from the mass.

9. The capacitive sensor of claim 8 wherein the at least one second electrode attached to the substrate includes a plurality of second electrodes attached to the substrate.

10. The capacitive sensor of claim 9 wherein the plurality of first electrodes are disposed adjacent to the plurality of second electrodes to form a plurality of substantially invariable gaps between specified pairs of the first and second electrodes.

11. A method of fabricating a capacitive sensor, comprising the steps of:

covering a surface of a substrate with a protection film;

transferring a predetermined pattern to the protection film to obtain a mask for forming at least one electrode in the substrate, the electrode having a tooth profile including a plurality of teeth, each of the plurality of teeth having a predetermined geometric shape;

in a first etching step, etching, using the mask, the electrode having the tooth profile to a specified depth in the substrate;

removing portions of the protection film to expose a plurality of regions on the surface of the substrate, the plurality of regions corresponding to locations between the plurality of teeth of the tooth profile;

in a second etching step, at least partly etching the exposed regions of the substrate to obtain the predetermined geometric shape of the plurality of teeth of the tooth profile; and

in a third etching step, etching the substrate to release the at least one electrode having the tooth profile from the substrate.

12. The method of claim 11 wherein the predetermined geometric shape of the respective teeth includes a substantially rectangular shape.

13. The method of claim 11 wherein the predetermined geometric shape of the respective teeth includes a substantially square shape.

14. The method of claim 11 wherein the predetermined geometric shape of the respective teeth includes a substantially rounded shape.

15. The method of claim 11 wherein each of the first, second, and third etching steps includes deep reactive ion etching (DRIE) of the substrate.