SEMICONDUCTOR DEVICE

• US 20120068274A1
• Filed: 03/22/2011
• Published: 03/22/2012
• Est. Priority Date: 09/17/2010
• Status: Abandoned Application

• Current Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: Kato, Masanori
• Application Number:
  US13/053,401
• Publication Number:
  US 20120068274A1
• Time in Patent Office: Days
• US Class Current: 257/401
• CPC Class Codes: H01L 21/823475 interconnection or wiring or contact manufacturing related aspects
• CPC Class Codes: H01L 21/823481 isolation region manufacturing related aspects, e.g. to avoid interaction of isolation region with adjacent structure
• CPC Class Codes: H01L 27/0207 Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique

Abstract

According to one embodiment, a semiconductor device has a substrate comprising an element isolation area, a plurality of tetragonal active areas on the substrate separated by the element isolation area from each other, each of the active areas having an impurity diffusion area, a large active area comprising at least a part of the active areas, an outline of the large active area including a bump. Among the impurity diffusion areas of the active areas, impurity diffusion areas facing through the element isolation area are electrically connected.

Claims

1. A semiconductor device comprising:

a substrate comprising an element isolation area;

a plurality of tetragonal active areas on the substrate separated by the element isolation area from each other, each of the active areas having an impurity diffusion area; and

a large active area comprising at least a part of the active areas, an outline of the large active area including a bump,

wherein among the impurity diffusion areas of the active areas, impurity diffusion areas facing through the element isolation area are electrically connected.

2. The device of claim 1, wherein at least one facing pair of the impurity diffusion areas facing through the element isolation area are connected by at least a first contact plug whose bottom contacts both of the pair of impurity diffusion areas.

3. The device of claim 1, wherein the element isolation area comprises:

a first element isolation area formed in a first direction; and

a second element isolation area formed in a second direction intersecting with the first direction,

at least one of the active areas comprises;

a first active area and a second active area separated by the first element isolation area from each other;

a third active area separated from the first active area by the second element isolation area; and

a fourth active area separated from the second active area by the first element isolation area and separated from the third active area by the first element isolation area,

wherein the impurity diffusion areas of the first to the fourth active areas are connected by a first contact plug whose bottom contacts all of the impurity diffusion areas of the first to the fourth active areas.

4. The device of claim 1, wherein at least one facing pair of the impurity diffusion areas facing through the element isolation area are connected by second contact plugs and a wire, each of the second contact plugs being connected to each of the pair of the impurity diffusion areas, and the wire connecting the second contact plugs to each other.

5. The device of claim 1, wherein the element isolation area comprises:

a first element isolation area formed in a first direction; and

a second element isolation area formed in a second direction intersecting with the first direction,

at least one of the active areas comprises;

a first active area and a second active area separated by the element isolation area from each other;

a third active area separated from the first active area by the second element isolation area; and

a fourth active area separated from the second active area by the first element isolation area and separated from the third active area by the first element isolation area,

wherein the impurity diffusion areas of the first to the fourth active areas are connected by second contact plugs and a wire, each of the second contact plugs being connected to each of the impurity diffusion areas, and the wire connecting the second contact plugs to each other.

6. The device of claim 1 further comprising a plurality of gate electrodes above the active areas,

wherein each of the impurity diffusion areas comprises:

a first impurity diffusion area at one side of each of the gate electrodes; and

a second impurity diffusion area at the other side of each of the gate electrodes.

7. The device of claim 6, wherein at least one of the gate electrodes is formed in common above at least a pair of the active areas of the active areas separated by the element isolation area.

8. The device of claim 7, wherein one of the gate electrodes is orthogonal to the element isolation area separating at least the pair of the active areas.

9. The device of claim 6, wherein at least two of the first and the second impurity diffusion areas are set to be a first potential, and the others are set to be a second potential.

10. The device of claim 1, wherein the active areas have an identical shape and an identical dimension.

11. The device of claim 1, wherein the active areas are arranged periodically.

12. The device of claim 1, wherein at least one of the active areas comprises:

a first active area out of the large active area and neighboring the large active area; and

a second active area continuous to the first active area,

wherein the first active area is electrically separated from the second active area by a dummy gate electrode whose potential is fixed at a predetermined potential.

13. The device of claim 12, wherein the predetermined potential is set according to a polarity of the first and the second active areas.

14. The device of claim 1, wherein a shape of the large active area is obtained by combining two or more tetragons each of which has a different dimension.