Source Polarization Optimization
First Claim
1. A computer-implemented method for improving a lithographic process simulation, comprising:
- representing each source point in a preselected group of source points at a pupil plane of an illumination source by one or more variable parameters, wherein at least some of the one or more variable parameters characterize a polarization state at the source point;
forming a cost function comprising an aerial image intensity of a representation of a design layout projected using the preselected group of source points;
computing a gradient of the cost function with respect to the at least some of the one or more variable parameters;
iteratively reconfiguring one or both of the preselected group of source points in the illumination source and the representation of the design layout based on the computed gradient until a desired lithographic response is obtained.
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Abstract
A lithographic simulation process is described, where each source point in a preselected group of source points at a pupil plane of an illumination source is represented by one or more variable parameters, wherein at least some of the variable parameters characterize a polarization state at the source point. One or both of the preselected group of source points in the illumination source and a representation of the design layout are iteratively reconfigured based on a computed gradient of a cost function with respect to the one or more variable parameters until a desired lithographic response is obtained, wherein the cost function comprises an aerial image intensity of a representation of the design layout projected using the preselected group of source points. Physical hardware to implement the source polarization variation is also described.
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Citations
20 Claims
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1. A computer-implemented method for improving a lithographic process simulation, comprising:
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representing each source point in a preselected group of source points at a pupil plane of an illumination source by one or more variable parameters, wherein at least some of the one or more variable parameters characterize a polarization state at the source point; forming a cost function comprising an aerial image intensity of a representation of a design layout projected using the preselected group of source points; computing a gradient of the cost function with respect to the at least some of the one or more variable parameters; iteratively reconfiguring one or both of the preselected group of source points in the illumination source and the representation of the design layout based on the computed gradient until a desired lithographic response is obtained. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method for improving a lithographic process, comprising:
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representing each source point in a preselected group of source points at a pupil plane of an illumination source by one or more variable parameters in a simulation of the lithographic process, wherein at least some of the one or more variable parameters characterize a polarization state at the source point; iteratively reconfiguring one or both of the preselected group of source points in the illumination source and a representation of the design layout based on a computed gradient of a cost function with respect to the at least some of the one or more variable parameters until a desired lithographic response is obtained, wherein the cost function comprises an aerial image intensity of a representation of the design layout projected using the preselected group of source points. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A computer-implemented method for improving a lithographic process simulation, comprising:
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representing each source point in a preselected group of source points at a pupil plane of an illumination source by one or more variable parameters, wherein at least some of the one or more variable parameters characterize a polarization state and an intensity at the source point; forming a cost function comprising an aerial image intensity of a representation of a design layout projected using the preselected group of source points; computing a gradient of the cost function with respect to the at least some of the one or more variable parameters; iteratively reconfiguring one or both of the preselected group of source points in the illumination source and the representation of the design layout based on the computed gradient until a desired lithographic response is obtained.
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Specification