HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD FOR HEATING SUBSTRATE BY IRRADIATING SUBSTRATE WITH FLASHES OF LIGHT
First Claim
1. A heat treatment apparatus for heating a substrate by irradiating the substrate with flashes of light, comprising:
- a chamber for receiving a substrate;
a holder for holding the substrate within said chamber;
a flash lamp for irradiating the substrate held by said holder with flashes of light;
a photodiode for receiving radiant light emitted from the substrate held by said holder;
a storage part for storing a table showing a correlation between radiant energy per unit time from the substrate and an output from said photodiode;
an energy calculating part for determining, from the output from said photodiode, the radiant energy emitted per unit time from the substrate irradiated with flashes of light from said flash lamp, based on said table; and
a temperature determining part for determining the surface temperature of the substrate from the radiant energy per unit time from the substrate determined by said energy calculating part.
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Accused Products
Abstract
Radiant energy from a semiconductor wafer which is determined from the theoretical value of black body radiation and the actually measured result of an output from a photodiode are brought into correspondence with each other, and a table showing a correlation therebetween is acquired and stored on a magnetic disk. When a semiconductor wafer to be treated is irradiated with flashes of light from flash lamps, the photodiode receives radiant light emitted from the semiconductor wafer. A controller determines, from the output from the photodiode, the radiant energy emitted per unit time from the semiconductor wafer irradiated with flashes of light, based on the acquired table. The controller further determines the surface temperature of the semiconductor wafer from the determined radiant energy.
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Citations
16 Claims
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1. A heat treatment apparatus for heating a substrate by irradiating the substrate with flashes of light, comprising:
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a chamber for receiving a substrate; a holder for holding the substrate within said chamber; a flash lamp for irradiating the substrate held by said holder with flashes of light; a photodiode for receiving radiant light emitted from the substrate held by said holder; a storage part for storing a table showing a correlation between radiant energy per unit time from the substrate and an output from said photodiode; an energy calculating part for determining, from the output from said photodiode, the radiant energy emitted per unit time from the substrate irradiated with flashes of light from said flash lamp, based on said table; and a temperature determining part for determining the surface temperature of the substrate from the radiant energy per unit time from the substrate determined by said energy calculating part. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of heating a substrate by irradiating the substrate with flashes of light, comprising the steps of:
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(a) acquiring a table showing a correlation between radiant energy per unit time from a substrate and an output from a photodiode receiving radiant light emitted from the substrate; (b) irradiating the substrate with flashes of light from a flash lamp; (c) determining, from the output from said photodiode, the radiant energy emitted per unit time from the substrate irradiated with flashes of light, based on said table; and (d) determining the surface temperature of the substrate from the radiant energy per unit time from the substrate determined in said step (c). - View Dependent Claims (11, 12, 13, 14, 15, 16)
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Specification