Fast photoresist model
First Claim
1. A method of modeling an image intended to reside in a photoresist film on a substrate, comprising electronically producing a simulated latent acid image of the image, compressing the simulated latent acid image in a predetermined direction, and developing the simulated latent acid image to a pattern that enables transfer of the pattern to the substrate.
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Accused Products
Abstract
A method of modeling an image intended to reside in a photoresist film on a substrate is provided. A simulated latent acid image of the image is produced, the simulated latent acid image is compressed in a predetermined direction, and developed to a pattern that enables (a) transfer of the pattern to the substrate or (b) further modeling of the pattern for transfer to the substrate.
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Citations
20 Claims
- 1. A method of modeling an image intended to reside in a photoresist film on a substrate, comprising electronically producing a simulated latent acid image of the image, compressing the simulated latent acid image in a predetermined direction, and developing the simulated latent acid image to a pattern that enables transfer of the pattern to the substrate.
- 11. A method of modeling an image intended to reside in a photoresist film on a substrate, comprising electronically producing a simulated latent acid image of the image, compressing the simulated latent acid image in a predetermined direction, and developing the simulated latent acid image to a pattern that enables further modeling of the pattern for transfer to the substrate.
Specification