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Fast photoresist model

  • US 20120079436A1
  • Filed: 09/28/2011
  • Published: 03/29/2012
  • Est. Priority Date: 09/29/2010
  • Status: Active Grant
First Claim
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1. A method of modeling an image intended to reside in a photoresist film on a substrate, comprising electronically producing a simulated latent acid image of the image, compressing the simulated latent acid image in a predetermined direction, and developing the simulated latent acid image to a pattern that enables transfer of the pattern to the substrate.

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