MEASUREMENT METHOD AND MEASUREMENT SYSTEM FOR MEASURING BIREFRINGENCE

• US 20120092669A1
• Filed: 09/20/2011
• Published: 04/19/2012
• Est. Priority Date: 03/20/2009
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Inventors: FIOLKA, Damian, ROHE, Marc
• Granted Patent: US 8,542,356 B2
• Time in Patent Office: Days
• US Class Current: 356/365
• CPC Class Codes: G01M 11/0257 by analyzing the image formed by the object to be tested
• CPC Class Codes: G01N 21/23 Bi-refringence
• CPC Class Codes: G03F 7/70566 Polarisation control
• CPC Class Codes: G03F 7/70591 Testing optical components

Abstract

A method measuring the birefringence of an object. A measurement beam having a defined input polarization state is generated, the measurement beam being directed onto the object. Polarization properties of the measurement beam after interaction with the object are detected in order to generate polarization measurement values representing an output polarization state of the measurement beam after interaction with the object. The input polarization state of the measurement beam is modulated into at least four different measurement states in accordance with a periodic modulation function of an angle parameter α, and the polarization measurement values associated with the at least four measurement states are processed to form a measurement function dependent on the angle parameter α. A two-wave portion of the measurement function is determined and analysed in order to derive at least one birefringence parameter describing the birefringence, preferably by double Fourier transformation of the measurement function.

Claims

1. A measurement system for measuring birefringence of an optical measurement object comprising:

a beam generating unit configured to generate a measurement beam having a defined input polarization state, the measurement beam being directed onto the measurement object;

a detector unit configured to detect polarization properties of the measurement beam after interaction with the measurement object and to generate polarization measurement values representing an output polarization state of the measurement beam; and

an evaluation unit configured to evaluate the polarization measurement values and to determine at least one birefringence parameter representing the birefringence of the measurement object,

wherein the beam generating unit is further configured to modulate the input polarization state of the measurement beam into at least four different measurement states in accordance with a periodic modulation function of an angle parameter α

; and

wherein the evaluation unit is further configured to proess the polarization measurement values associated with the at least four measurement states, to form a measurement function dependent on the angle parameter α

, to determine a two-wave portion of the measurement function and to analyze the two-wave portion, in order to derive the at least one birefringence parameter.

2. The measurement system according to claim 1, wherein the beam generating unit comprises, between a light source configured to generate linearly polarized light and the measurement object, a first polarization rotator configured to be controlled to rotate a polarization direction of the measurement beam.

3. The measurement system according to claim 2, wherein the first polarization rotator comprises a half-wave plate, which is configured to rotate about an optical axis of the measurement system under control of a first control device.

4. The measurement system according to claim 2, comprising a second polarization rotator configured as a 90°

polarization rotator that rotates the polarization state of the measurement beam by 90° and

which is configured to be introduced into and removed from the measurement beam path under control of a second control device.

5. The measurement system according to claim 4, wherein the second polarization rotator is arranged in proximity to a measurement object holding device and is configured to be introduced into and removed from a region between a first optical component and a second optical component of the measurement object, the measurement object comprising a plurality of optical components.

6. The measurement system according to claim 4, comprising a third polarization rotatorconfigured as a 90°

polarization rotator that rotates the polarization state of the measurement beam by 90° and

which is configured to be introduced into and removed from the measurement beam path in a region between the measurement object and the detector unit under control of a third control device.

7. The measurement system according to claim 4, wherein the 90°

polarization rotator is selected from the group consisting of;

a plate composed of optically active material;

a plate composed of intrinsically birefringent crystal material having a crystallographic <

110>

direction oriented substantially parallel to a transmission direction of the measurement beam; and

two low-order half-wave plates oriented at 45°

relative to one another, wherein optical crystal axes of the half-wave plates rotated relative to one another are substantially perpendicular to the transmission direction.

8. The measurement system according to claim 1, wherein the detector unit has an entrance openingconfigured to displace to predetermined positions in a plane perpendicularly to the optical axis of the measurement system.

9. The measurement system according to claim 1, wherein the detector unit is designed for an angularly resolving measurement of the polarization state.

19. The measurement system according to claim 1, comprising a polarization rotator configured as a 90°

polarization rotator that rotates the polarization state of the measurement beam by 90° and

which is configured to be introduced into and removed from the measurement beam path under control of a control device.

20. The measurement system according to claim 1, comprising a polarization rotatorconfigured as a 90°

polarization rotator that rotates the polarization state of the measurement beam by 90° and

which is configured to be introduced into and removed from the measurement beam path in a region between the measurement object and the detector unit under control of a control device.

10. A projection exposure apparatus for exposing a radiation-sensitive substrate arranged proximate to an image surface of a projection objective with at least one image of a pattern of a mask arranged proximate to an object surface of the projection objective, comprising:

a primary light source configured to emit primary light;

an illumination system configured to receive the primary light and to generate an illumination beam directed onto the mask;

a projection objective fconfigured to generate an image of the pattern proximate to the image surface of the projection objective; and

a measurement system configured to measure the birefringence of an optical measurement object arranged between the primary light source and the image surface of the projection objective, the measurement system comprising;

a beam generating unit configured to generate a measurement beam having a defined input polarization state, the measurement beam being directed onto the measurement object;

a detector unit configured to detect polarization properties of the measurement beam after interaction with the measurement object and to generate polarization measurement values representing an output polarization state of the measurement beam; and

an evaluation unit configured to evaluate the polarization measurement values and to determine at least one birefringence parameter representing the birefringence of the measurement object.

11. The projection exposure apparatus according to claim 10, wherein the primary light source of the projection exposure apparatus is comprised within the beam generating unit that generates the measurement beam directed onto the measurement object.

12. The projection exposure apparatus according to claim 10, wherein the detector unit is position, in lieu of a substrate to be exposed, in proximity to the image plane of the projection objective such that an entrance plane of the detector unit with an entrance opening is situated in the image surface of the projection objective or in an optically conjugate surface with respect to the image surface of the projection objective.

13. The projection exposure apparatus according to claim 12, wherein the entrance opening is configured to displace perpendicularly to the optical axis of the projection objective, to measure different field points within the image surface.

14. The projection exposure apparatus according to claim 10, wherein the detector unit is positioned, in lieu of a mask, proximate to the object surface of the projection object such that an entrance plane of the detector unit with an entrance opening is situated in the object surface of the projection objective or in an optically conjugate surface with respect to the object surface of the projection objective.

15. The projection exposure apparatus according to claim 10, wherein the measurement system is configured to carry out a measurement method comprising:

generating a measurement beam having a defined input polarization state, the measurement beam being directed onto the measurement object, the input polarization state being the polarization state of the measurement beam directly before the measurement beam enters into the measurement object;

detecting polarization properties of the measurement beam after interaction with the measurement object, to generate polarization measurement values representing an output polarization state of the measurement beam after interaction with the measurement object;

evaluating the polarization measurement values, to determine at least one birefringence parameter representing the birefringence of the measurement object,

modulating the input polarization state of the measurement beam into at least four different measurement states in accordance with a periodic modulation function of an angle parameter α

;

processing the polarization measurement values associated with the at least four measurement states, to form a measurement function dependent on the angle parameter α

;

determining a two-wave portion of the measurement function; and

analyzing the two-wave portion, to derive the at least one birefringence parameter.

16. A measurement method for measuring birefringence of a reticle, comprising:

arranging the reticle in an installation position between an illumination system and a projection objective of a projection exposure apparatus proximate to an object surface of the projection objective; and

measuring the birefringence of the reticle in the installation position with a measurement system for measuring the birefringence of an optical measurement object, wherein the measurement system is integrated into the projection apparatus.

17. The measurement method according to claim 16, further comprising performing the measurement after a reticle change and before an exposure using the reticle introduced by the change.

18. The measurement method according to claim 16, wherein the measurement method comprises:

generating a measurement beam having a defined input polarization state, the measurement beam being directed onto the measurement object, the input polarization state being the polarization state of the measurement beam directly before the measurement beam enters into the measurement object;

detecting polarization properties of the measurement beam after interaction with the measurement object in order to generate polarization measurement values representing an output polarization state of the measurement beam after interaction with the measurement object;

evaluating the polarization measurement values, to determine at least one birefringence parameter representing the birefringence of the measurement object,

modulating the input polarization state of the measurement beam into at least four different measurement states in accordance with a periodic modulation function of an angle parameter α

;

processing the polarization measurement values associated with the at least four measurement states, to form a measurement function dependent on the angle parameter α

;

determining a two-wave portion of the measurement function; and

analyzing the two-wave portion, to derive the at least one birefringence parameter; and

wherein the reticle serves as the measurement object.