Charged Particle Source with Integrated Electrostatic Energy Filter

• US 20120112090A1
• Filed: 11/10/2011
• Published: 05/10/2012
• Est. Priority Date: 11/10/2010
• Status: Active Grant

• Current Assignee: FEI Company (Thermo Fisher Scientific Incorporated)
• Original Assignee: FEI Company (Thermo Fisher Scientific Incorporated)
• Inventors: Henstra, Alexander
• Granted Patent: US 8,710,452 B2
• Time in Patent Office: Days
• US Class Current: 250/396.R
• CPC Class Codes: H01J 2237/0453 multiple apertures
• CPC Class Codes: H01J 2237/053 electrostatic
• CPC Class Codes: H01J 2237/057 Energy or mass filtering
• CPC Class Codes: H01J 2237/31713 Focused ion beam
• CPC Class Codes: H01J 37/05 Electron or ion-optical arrangements for separating electrons or ions according to their energy or massparticle separator tubes H01J49/00
• CPC Class Codes: H01J 37/06 Electron sources; Electron guns electron sources in general H01J1/02, H01J19/02; electron guns in general H01J3/02
• CPC Class Codes: H01J 37/08 Ion sources; Ion guns
• CPC Class Codes: H01J 37/09 Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
• CPC Class Codes: H01J 37/26 Electron or ion microscopes; Electron or ion diffraction tubes
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence

Abstract

A charged particle filter with an integrated energy filter, in which the charged particle emitter, the focusing electrodes, and the deflection electrodes are arranged round a straight axis. Where most energy filters used have a highly curved optical axis, and thus use parts with forms that are difficult to manufacture, the source according the invention uses electrodes surrounding a straight optical axis. A beam of charged particles can be deflected quite far from the axis showing respectable energy dispersion at an energy selecting slit without introducing coma or astigmatism that cannot be corrected, provided that some of the are formed as 120°/60°/120°/60°. Such electrodes can be attached to each other by gluing or brazing of ceramic, and then series of a highly concentric bores can be formed by, e.g., spark erosion.

Claims

1. A charged particle source with integrated electrostatic energy filter, the charged-particle source for use in a charged-particle apparatus, the charged particle source comprising:

p1 a charged particle emitter for producing a beam of charged particles around an axis,

a beam limiting aperture for selecting a part of the beam produced by the emitter, the beam limiting aperture positioned around the axis, thereby selecting an axial part of the beam,

an energy selecting aperture in an energy selective diaphragm for selecting particles with a desired energy spread from the part of the beam that passed through the beam limiting aperture,

electrodes for forming a focus of the charged particle emitter on the energy selective diaphragm, and

electrodes for producing electrostatic dipole fields for deflecting the beam,

in which the charged particle emitter and the electrodes are arranged round the axis, the axis being a straight axis.

2. The charged particle source of claim 1 in which at least some of the electrodes are equipped to generate weak quadrupole fields for correcting astigmatism and/or coma of the beam exiting the source.

3. The charged particle source of claim 1 in which the electrodes in working are excited such that the beam exiting the source does not show energy dispersion.

4. The charged particle source of claim 1 comprising at least two energy selective apertures, the two energy selective apertures having different dimensions and/or different distances from the axis, the two energy selective apertures for passing charged particle beams with different energy width and different beam current.

5. The charged particle source of claim 4 in which one of the energy selective apertures is located at the axis for passing a beam of particles without energy filtering said beam.

6. The charged particle source of claim 1 in which the charged particle emitter is a electron source of the group of thermionic sources, thermal field emitters, cold field emitters, Schottky emitters, carbon nanotubes, and semiconductor emitters, or an ion source of the group of liquid metal ion sources, gas ion sources, and liquid helium sources.

7. The charged particle source of claim 1 in which at least one of the electrodes is a 120°

/60°

/120°

/60°

segmented electrode.

8. The charged particle source of claim 1 in which in use the coma of the image formed on the energy selective diaphragm has a diameter less than the geometric image size of the emitter.

9. The charged particle source of claim 1 in which additional electrodes are present for forming a cross-over between the emitter and the energy selective diaphragm.

10. Charged-particle apparatus equipped with a charged particle source according to of claim 1.

11. The charged-particle apparatus of claim 10, in which the charged-particle apparatus is equipped with a Scanning Electron Microscope (SEM) column and/or a Transmission Electron Microscope (TEM) column and/or a Focused Ion Beam (FIB) column.

20. The charged particle source of claim 1 further comprising additional electrodes for forming a crossover between the emitter and the energy selective diaphragm.

12. A charged particle source with integrated electrostatic energy filter, the charged-particle source for use in a charged-particle apparatus, the charged particle source comprising:

a charged particle emitter for producing a beam of charged particles along a first axis;

a beam limiting aperture for selecting a part of the beam produced by the emitter, the beam limiting aperture positioned around the axis, thereby selecting an axial part of the beam;

an energy selecting aperture in an energy selective diaphragm for selecting particles with a desired energy spread from the part of the beam that passed through the beam limiting aperture;

electrodes for forming a focus of the charged particle emitter on the energy selective diaphragm; and

electrodes for producing electrostatic dipole fields for deflecting the beam;

wherein the electrodes for forming a focus and the electrodes for deflecting the beam are all arranged to be concentric with the first axis.

13. The charged particle source of claim 12 in which at least some of the electrodes are equipped to generate weak quadrupole fields for correcting astigmatism and/or coma of the beam exiting the source.

14. The charged particle source of claim 12 in which the electrodes in working are excited such that the beam exiting the source does not show energy dispersion.

15. The charged particle source of claim 12 comprising at least two energy selective apertures, the two energy selective apertures having different dimensions and/or different distances from the axis, the two energy selective apertures for passing charged particle beams with different energy width and different beam current.

16. The charged particle source of claim 15 in which one of the energy selective apertures is located at the axis for passing a beam of particles without energy filtering of said beam.

17. The charged particle source of claim 12 in which the charged particle emitter is a electron source of the group of thermionic sources, thermal field emitters, cold field emitters, Schottky emitters, carbon nanotubes, and semiconductor emitters, or an ion source of the group of liquid metal ion sources, gas ion sources, and liquid helium sources.

18. The charged particle source of claim 12 in which at least one of the electrodes is a 120°

/60°

/120°

/60°

segmented electrode.

19. The charged particle source of claim 12 in which the coma of the image formed on the energy selective diaphragm has a diameter less than the geometric image size of the emitter.