Apparatus and Method For Incorporating Composition Into Substrate Using Neutral Beams
First Claim
1. A method of processing a surface of a substrate using neutral beams, comprising the steps of:
- (a) forming an oxide layer on the substrate;
(b) applying the neutral beams to the oxide layer to incorporate at least one of O, N and F elements into the oxide layer; and
wherein the neutral beams are generated through the steps of;
injecting a gas including at least one of O2, N2, CXFY (where x=1 to 4, y=2 to
8) and NF3 for generating ion beams through an inlet into an ion source;
generating the ion beams having a polarity from the injected gas in the ion source; and
converting the ion beams into the neutral beams containing at least one of O, N and F elements.
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Accused Products
Abstract
An apparatus and method for processing a surface of a substrate using neutral beams are provided to repeatedly process an oxide layer using the neutral beams having low energy to minimize electrical damage to the oxide layer and improve characteristics of the oxide layer. The apparatus is mounted in a plasma generating chamber, and includes: an ion beam generating gas inlet, which injects a gas for generating ion beams; an ion source, which generates the ion beams having a polarity from the gas introduced through the ion beam generating gas inlet; a grid assembly, which is installed on one end of the ion source; a reflector, which is aligned with the grid assembly and converts the ion beams to the neutral beams; and a stage, on which the substrate is placed on a traveling path of the neutral beams.
11 Citations
8 Claims
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1. A method of processing a surface of a substrate using neutral beams, comprising the steps of:
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(a) forming an oxide layer on the substrate; (b) applying the neutral beams to the oxide layer to incorporate at least one of O, N and F elements into the oxide layer; and wherein the neutral beams are generated through the steps of; injecting a gas including at least one of O2, N2, CXFY (where x=1 to 4, y=2 to
8) and NF3 for generating ion beams through an inlet into an ion source;generating the ion beams having a polarity from the injected gas in the ion source; and converting the ion beams into the neutral beams containing at least one of O, N and F elements. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification