Stereolithography Machine

• US 20120133083A1
• Filed: 08/03/2010
• Published: 05/31/2012
• Est. Priority Date: 08/03/2009
• Status: Active Grant

• Current Assignee: Dws S.R.L.
• Original Assignee: Dws S.R.L.
• Inventors: Zenere, Sergio
• Granted Patent: US 8,945,456 B2
• Time in Patent Office: Days
• US Class Current: 264/401
• CPC Class Codes: B29C 64/135 the energy source being concentrated, e.g. scanning lasers or focused light sources
• CPC Class Codes: B29C 64/295 Heating elements
• CPC Class Codes: B29C 64/393 for controlling or regulating additive manufacturing processes

Abstract

The invention is a stereolithography machine (1) comprising the following: a support plate (2) provided with a hole (2a); a container (3) associated with the support plate (2) and comprising a transparent bottom (3a); a radiation source (4) arranged below the support plate (2) and suited to convey a radiation beam towards the transparent bottom (3a) through the hole (2a); a temperature control unit (5) suited to maintain the support plate (2) at a predetermined temperature.

Claims

1. ) Stereolithography machine comprising:

a container suited to contain a fluid substance and provided with a transparent bottom;

a support plate provided with a hole, said support plate being designed to house said container so that said transparent bottom faces said hole;

a radiation source arranged below said support plate, suited to convey a radiation beam towards said transparent bottom through said hole;

wherein it comprises a temperature control unit suited to maintain said support plate at a predetermined temperature.

2. ) Stereolithography machine according to claim 1), wherein said temperature control unit comprises at least one heating element thermally coupled with said support plate.

3. ) Stereolithography machine according to claim 2), wherein said temperature control unit comprises a temperature sensor thermally coupled with said support plate.

4. ) Stereolithography machine according to claim 2), wherein said heating element and said temperature sensor are operatively connected to a control unit suited to keep the temperature of said support plate at a constant value.

5. ) Stereolithography machine according to claim 2), wherein said heating element is an electric resistor.

6. ) Stereolithography machine according to claim 2), wherein it comprises two of said heating elements, thermally coupled with said support plate on opposite sides with respect to said hole.

7. ) Stereolithography machine according to claim 2), wherein said heating element is arranged in contact with said support plate.

8. ) Stereolithography machine according to claim 7), wherein said support plate comprises a recess for housing said heating element.

9. ) Stereolithography machine according to claim 8), wherein said recess is provided with a cover removably mounted on said support plate.

10. ) Stereolithography machine according to claim 1), wherein said radiation beam is a laser beam.

11. ) Stereolithography method comprising the following operations:

preparing a fluid substance suited to solidify when exposed to a predetermined radiation beam;

preparing a container suited to contain said fluid substance and provided with a transparent bottom;

filling said container with said fluid substance;

associating said container with a support plate provided with a hole for the passage of said radiation beam, so that the transparent bottom of said container faces said hole;

conveying said radiation beam towards said transparent bottom through said hole;

wherein said fluid substance is a mixture of different components that tend to separate at room temperature, and wherein said method comprises the operation of heating said container so as to maintain said fluid substance at a predetermined temperature, suited to prevent said separation of said components.