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SUBSTRATE-PROCESSING APPARATUS AND SUBSTRATE-PROCESSING METHOD FOR SELECTIVELY INSERTING DIFFUSION PLATES

  • US 20120135145A1
  • Filed: 07/02/2010
  • Published: 05/31/2012
  • Est. Priority Date: 07/08/2009
  • Status: Active Grant
First Claim
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1. A substrate-processing apparatus comprising:

  • a lower chamber having an opened upper side;

    an upper chamber opening or closing the upper side of the lower chamber, the upper chamber cooperating with the lower chamber to define an inner space in which a process for processing a substrate is performed;

    a shower head disposed in a lower portion of the upper chamber to supply a reaction gas toward the inner space, the shower head together with the upper chamber defining a buffer space therebetween;

    a gas supply port disposed in the upper chamber to supply the reaction gas into the buffer space; and

    a diffusion unit disposed in the buffer space to diffuse the reaction gas supplied through the gas supply port,wherein the diffusion unit comprises;

    a plurality of diffusion areas in which the reaction gas is diffused, the plurality of diffusion areas being blocked from each other;

    a plurality of diffusion holes communicating with the gas supply port and the diffusion areas, respectively; and

    one or more diffusion plates each having a shape corresponding to each of the diffusion areas, the one or more diffusion plates being selectively inserted into the diffusion areas.

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