SUBSTRATE-PROCESSING APPARATUS AND SUBSTRATE-PROCESSING METHOD FOR SELECTIVELY INSERTING DIFFUSION PLATES
First Claim
1. A substrate-processing apparatus comprising:
- a lower chamber having an opened upper side;
an upper chamber opening or closing the upper side of the lower chamber, the upper chamber cooperating with the lower chamber to define an inner space in which a process for processing a substrate is performed;
a shower head disposed in a lower portion of the upper chamber to supply a reaction gas toward the inner space, the shower head together with the upper chamber defining a buffer space therebetween;
a gas supply port disposed in the upper chamber to supply the reaction gas into the buffer space; and
a diffusion unit disposed in the buffer space to diffuse the reaction gas supplied through the gas supply port,wherein the diffusion unit comprises;
a plurality of diffusion areas in which the reaction gas is diffused, the plurality of diffusion areas being blocked from each other;
a plurality of diffusion holes communicating with the gas supply port and the diffusion areas, respectively; and
one or more diffusion plates each having a shape corresponding to each of the diffusion areas, the one or more diffusion plates being selectively inserted into the diffusion areas.
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Accused Products
Abstract
According to one embodiment of the present invention, a substrate-processing apparatus comprises: a lower chamber with an open top; an upper chamber which covers the top of the lower chamber, and which cooperates with the lower chamber to form an internal space for substrate-processing; a shower head arranged in a lower portion of the upper chamber to supply reaction gas to the internal space, and forming a buffer space between the shower head and the upper chamber; a gas supply port formed in the upper chamber to supply reaction gas to the buffer space; and a diffusion unit arranged in the buffer space to diffuse the reaction gas supplied through the gas supply port. The diffusion unit includes: a plurality of diffusion areas which are blocked from each other, in order to enable the reaction gas to be diffused therein; a plurality of diffusion holes for placing the gas supply port and the diffusion areas in communication; and one or more diffusion plates, the shapes of which correspond to the shapes of the diffusion areas, and which are selectively inserted into the respective diffusion areas.
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Citations
13 Claims
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1. A substrate-processing apparatus comprising:
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a lower chamber having an opened upper side; an upper chamber opening or closing the upper side of the lower chamber, the upper chamber cooperating with the lower chamber to define an inner space in which a process for processing a substrate is performed; a shower head disposed in a lower portion of the upper chamber to supply a reaction gas toward the inner space, the shower head together with the upper chamber defining a buffer space therebetween; a gas supply port disposed in the upper chamber to supply the reaction gas into the buffer space; and a diffusion unit disposed in the buffer space to diffuse the reaction gas supplied through the gas supply port, wherein the diffusion unit comprises; a plurality of diffusion areas in which the reaction gas is diffused, the plurality of diffusion areas being blocked from each other; a plurality of diffusion holes communicating with the gas supply port and the diffusion areas, respectively; and one or more diffusion plates each having a shape corresponding to each of the diffusion areas, the one or more diffusion plates being selectively inserted into the diffusion areas. - View Dependent Claims (2, 3, 4, 5)
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6. A substrate-processing apparatus comprising:
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a chamber defining an inner space in which a process for processing a substrate is performed; and a diffusion unit disposed in an upper portion of the chamber to diffuse a reaction gas supplied from the outside, wherein the diffusion unit comprises; a plurality of diffusion areas in which the reaction gas is diffused, the plurality of diffusion areas being blocked from each other; and one or more diffusion plates selectively inserted into the diffusion areas. - View Dependent Claims (7, 8, 9)
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10. A substrate-processing method using a diffusion unit comprising a plurality of diffusion areas disposed in an upper portion of a chamber to diffuse a reaction gas supplied from the outside and blocked from each other, the substrate-processing method comprising:
selectively inserting diffusion plates into the diffusion areas to control a process rate with respect to a substrate. - View Dependent Claims (11, 12, 13)
Specification