SYSTEMS AND METHODS FOR MOVING WEB ETCH, CVD, AND ION IMPLANT

• US 20120138230A1
• Filed: 12/06/2011
• Published: 06/07/2012
• Est. Priority Date: 12/06/2010
• Status: Abandoned Application

• Current Assignee: Intevac
• Original Assignee: Intevac
• Inventors: BLUCK, Terry, Grimard, Dennis, Janakiraman, Karthik, Chun, Moon, Cho, Young Kyu
• Application Number:
  US13/312,957
• Publication Number:
  US 20120138230A1
• Time in Patent Office: Days
• US Class Current: 156/345.54
• CPC Class Codes: C23C 16/4583 the substrate being supported substantially horizontally
• CPC Class Codes: C23C 16/54 Apparatus specially adapted for continuous coating
• CPC Class Codes: G21K 5/02 having no beam-forming means
• CPC Class Codes: G21K 5/10 with provision for relative movement of beam source and object to be irradiated
• CPC Class Codes: H01L 21/67706 Mechanical details, e.g. roller, belt H01L21/67709 takes precedence
• CPC Class Codes: H01L 21/6776 Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers

Abstract

Systems and methods for moving substrates through process chambers for photovoltaic (PV) or solar cell applications are disclosed. In particular, systems and methods for moving substrates through process chambers using a conveyor belt are disclosed. The conveyor belt can be used to move the substrates through etch chambers, chemical vapor deposition (CVD) chambers, and/or ion implant chambers, and the like.

Claims

1. A chemical vapor deposition (CVD) system comprising:

a CVD chamber comprising an inlet and an outlet; and

a conveyor belt to transport wafers from the inlet of the chamber to the outlet of the chamber.

2. The system of claim 1, wherein the conveyor belt comprises an aluminum oxide fabric belt.

3. The system of claim 1, wherein the conveyor belt comprises a roller at each end of the conveyor belt.

4. The system of claim 1, further comprising a grounded electrode, wherein the conveyor belt passes over the grounded electrode.

5. The system of claim 4, further comprising a grounded drag plate to support the conveyor belt and the grounded electrode.

6. The system of claim 1, wherein the conveyor belt operates in a continuous mode.

7. The system of claim 1, wherein the conveyor belt operates in a static mode.

8. The system of claim 1, wherein the conveyor belt operates in a start/stop with left/right and forward backward/jog mode.

9. The system of claim 1, wherein the chamber further comprises a vacuum system and a radio frequency (RF) powered shower head.

10. An etching system comprising:

an etch chamber comprising an inlet and an outlet; and

a conveyor belt to transport wafers from the inlet of the chamber to the outlet of the chamber.

11. The system of claim 10, wherein the conveyor belt comprises an aluminum oxide fabric belt.

12. The system of claim 10, wherein the conveyor belt comprises a roller at each end of the conveyor belt.

13. The system of claim 10, wherein the conveyor belt operates in a continuous mode.

14. The system of claim 10, wherein the conveyor belt operates in a static mode.

15. The system of claim 10, further comprising a direct current (DC) electrode coupled to the conveyor belt.

16. The system of claim 15, further comprising a cooled radio frequency (RF) biased drag plate coupled to the DC electrode, the drag plate to support the conveyor belt and provide bias power to the wafer, chuck the wafer and cool the wafer.

17. The system of claim 10, wherein the etch chamber further comprises a vacuum system and at least one radio frequency powered coil to generate the plasma for the chamber.

18. The system of claim 10, wherein the conveyor belt operates in a start/stop with left/right and forward/backward jog mode.

19. An ion implant system comprising:

an ion implant chamber comprising an inlet and an outlet; and

a conveyor belt to transport wafers from the inlet of the chamber to the outlet of the chamber.

20. The system of claim 19, wherein the conveyor belt comprises an aluminum oxide fabric belt.

21. The system of claim 19, wherein the conveyor belt comprises a roller at each end of the conveyor belt.

22. The system of claim 19, wherein the conveyor belt operates in a continuous mode.

23. The system of claim 19, wherein the conveyor belt operates in a static mode.

24. The system of claim 19, wherein the chamber further comprises a vacuum system and at least one ion implant source.

25. The system of claim 19, wherein the conveyor belt operates in a start/stop with left/right and forward backward/jog mode.