Miniature mass spectrometer system

• US 20120138790A1
• Filed: 12/06/2011
• Published: 06/07/2012
• Est. Priority Date: 12/07/2010
• Status: Active Grant

• Current Assignee: Microsaic Systems Plc
• Original Assignee: Microsaic Systems Plc
• Inventors: Wright, Steven, Wright, Christopher
• Granted Patent: US 8,796,616 B2
• Time in Patent Office: Days
• US Class Current: 250/288
• CPC Class Codes: H01J 49/0013 Miniaturised spectrometers, e.g. having smaller than usual scale, integrated conventional components
• CPC Class Codes: H01J 49/063 Multipole ion guides, e.g. quadrupoles, hexapoles
• CPC Class Codes: H01J 49/24 Vacuum systems, e.g. maintaining desired pressures

Abstract

A miniature mass spectrometer that may be coupled to an atmospheric pressure ionisation source is described. Ions pass through a small orifice from a region at atmospheric pressure or low vacuum, and undergo efficient collisional cooling as they transit a very short, differentially pumped ion guide. A narrow beam of low energy ions is passed through a small aperture and into a separate chamber containing the mass analyser.

Claims

1. A miniature mass spectrometer system comprising a plurality of vacuum chambers, the system further comprising:

a. an ion source operating substantially at atmospheric pressure and employing electrospray ionisation, microspray ionisation, nanospray ionisation, chemical ionisation, or derivatives thereof;

b. an rf ion guide provided within an ion guide vacuum chamber of the system, the ion guide defining a ion path between an entrance and exit to the ion guide vacuum chamber, the dimensions and geometry of the ion guide being such that apertures through which gas may escape from the ion guide have a total area less than 10 cm²; and

c. a mass analyser provided within a mass analyser vacuum chamber of the system;

wherein the vacuum chambers containing the rf ion guide and the mass analyser are operably pumped at a pressure lower than about 5×

10<sup>−

2</sup> Torr, other vacuum chambers of the system, where provided, being operably pumped at a pressure higher than about 50 Torr.

2. The system of claim 1 wherein each of the ion guide and mass analyser vacuum chambers is coupled to a pump, the effective pumping speed in the ion guide chamber being operably greater than the effective pumping speed in the mass analyser chamber.

3. The system of claim 1 wherein the apertures through which gas may escape from the ion guide have a total area less than 6 cm².

4. The system of claim 1 wherein the apertures through which gas may escape from the ion guide have a total area less than 2 cm².

5. The system of claim 1 wherein the ion guide is dimensioned and configured to provide a conductance of less than approximately 10 L/s.

6. The system of claim 1 wherein the ion guide is dimensioned and configured to provide a conductance of less than approximately 100 L/s.

7. The system of claim 1 wherein the ion guide has a length selected in combination with the operable pressure in the vicinity of the ion guide such that the product of the pressure in the vicinity of the rf ion guide and the length of the ion guide is greater than 0.01 Torr-cm.

8. The system of claim 7 wherein the ion guide chamber and the mass analyser chamber are separated by an aperture with operably more than 40% of the ions exiting the ion guide being transmitted through the aperture and into the next vacuum chamber.

9. The system of claim 1 wherein the ion guide has a length selected in combination with the operable pressure in the vicinity of the ion guide such that the product of the pressure in the vicinity of the rf ion guide and the length of the ion guide is greater than 0.01 Torr-cm and less than 0.02 Torr-cm.

10. The system of claim 9 wherein the ion guide chamber and the mass analyser chamber are separated by an aperture with operably more than 40% of the ions exiting the ion guide being transmitted through the aperture and into the next vacuum chamber.

11. The system of claim 8 wherein operably the average axial kinetic energy of ions that have passed through the aperture is substantially less than the injection energy into the ion guide.

12. The system of claim 2 wherein the pump coupled to each of the ion guide and mass analyser chambers is selected from one or more turbomolecular pumps with foreline pumping provided by one or more diaphragm pumps

13. The system of claim 2 further comprising a housing, each of the ion guide and mass analyser chambers and the pump(s) coupled thereto being provided within the housing.

14. The system of claim 1 wherein the ion guide is a quadrupole ion guide.

15. The system of claim 1 wherein the ion guide is a multipole ion guide.

16. The system of claim 1 wherein the ion guide is a stacked ring ion guide.

17. The system of claim 1 wherein the mass analyser is a quadrupole mass filter.

18. The system of claim 1 wherein the mass analyser is an ion trap.

19. The system of claim 1 comprising a split-flow turbomolecular pump operably configured to pump the ion guide and mass analyser chambers.

20. The system of claim 1 wherein the ion guide chamber is pumped by a turbomolecular pump whose rotor axis is parallel to the central axis of the rf ion guide.

21. The system of claim 1 comprising a differentially pumped flow partitioning interface provided before the ion guide chamber.

22. The system of claim 1 further comprising a vacuum interface chamber provided upstream of the ion guide and mass analyser chambers, the system being configured such that ions generated by an atmospheric pressure ionisation source may be operably transmitted through the vacuum interface and the ion guide prior to introduction to the mass analyser.

23. The system of claim 1 configured such that the gas flow into the ion guide chamber is two orders of magnitude greater than the gas flow into the mass analyser chamber.

24. The system of claim 1 wherein each of the ion guide and mass analyser is operably connected to a waveform generator, the system being configured such that only the rf component is operably coupled to the ion guide.

25. The system of claim 1 comprising a second rf ion guide provided in a second ion guide chamber.

26. The system of claim 25 wherein the first and second rf ion guides are configured to replicate a single ion guide in a single chamber.