SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
First Claim
1. A semiconductor device, comprising a substrate, a channel region in the substrate, source/drain regions on both sides of the channel region, a gate structure on the channel region, and gate sidewall spacers formed on both sidewalls of the gate structure, characterized in that:
- each of the source/drain regions comprises epitaxially grown metal silicide, and a dopant segregation region is formed at the interface between each of the source/drain regions and the channel region.
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Abstract
Disclosed is a semiconductor device, comprising a substrate, a channel region in the substrate, source/drain regions on both sides of the channel region, a gate structure on the channel region, and gate sidewall spacers formed on the sidewalls of the gate structure, characterized in that each of the source/drain regions comprises an epitaxially grown metal silicide region, and dopant segregation regions are formed at the interfaces between the epitaxially grown metal silicide source/drain regions and the channel region. By employing the semiconductor device and the method for manufacturing the same according to embodiments of the present invention, the Schottkey Barrier Height of the MOSFETs with epitaxially grown ultrathin metal silicide source/drain may be lowered, thereby improving the driving capability.
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Citations
12 Claims
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1. A semiconductor device, comprising a substrate, a channel region in the substrate, source/drain regions on both sides of the channel region, a gate structure on the channel region, and gate sidewall spacers formed on both sidewalls of the gate structure, characterized in that:
each of the source/drain regions comprises epitaxially grown metal silicide, and a dopant segregation region is formed at the interface between each of the source/drain regions and the channel region. - View Dependent Claims (2, 3, 4, 5)
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6. A method for manufacturing a semiconductor device, comprising:
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forming a gate structure and gate sidewall spacers on the substrate; depositing a metal layer that covers the substrate, the gate structure, and the gate sidewall spacers; performing a first annealing such that the metal layer on both sides of the gate reacts with the substrate to form epitaxially grown metal silicide layers; stripping un-reacted metal layer, such that the epitaxially grown metal silicide layers form source/drain regions of the device, and a portion of the semiconductor substrate beneath the gate structure forms the channel region; implanting dopants into the epitaxially grown ultrathin silicide source/drain regions; and performing a second annealing to form dopant segregation regions at the interfaces between the epitaxially grown ultrathin silicide source/drain regions and the channel region. - View Dependent Claims (7, 8, 9, 10, 11, 12)
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Specification