X-RAY DIFFRACTION APPARATUS AND X-RAY DIFFRACTION MEASUREMENT METHOD

• US 20120140890A1
• Filed: 12/05/2011
• Published: 06/07/2012
• Est. Priority Date: 12/06/2010
• Status: Active Grant

• Current Assignee: Rigaku Corporation
• Original Assignee: Rigaku Corporation
• Inventors: Ozawa, Tetsuya, Inaba, Katsuhiko, Matsuo, Ryuji
• Granted Patent: US 9,074,992 B2
• Time in Patent Office: Days
• US Class Current: 378/74
• CPC Class Codes: G01N 23/207 Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions

Abstract

There is provided an X-ray diffraction apparatus comprising an X-ray topography device for providing a spatial geometric correspondence to an X-ray exiting from a planar region of a sample to detect the X-ray as a planar X-ray topograph, and outputting the X-ray topograph as a signal; a two-dimensional imaging device for receiving a light-image of the planar region of the sample and outputting the light-image as a signal specified by planar positional information; and a video-synthesizing arithmetic control device for generating synthesized video data on the basis of an output signal from the X-ray topograph and an output signal from the imaging device.

Claims

1. An X-ray diffraction apparatus comprising:

X-ray topography means for providing a spatial geometric correspondence to an X-ray exiting from a planar region of a sample to detect the X-ray as a planar X-ray topograph, and

outputting the X-ray topograph as a signal;

optical image-capturing means for receiving a light-image of the planar region of the sample and outputting the light-image as a signal specified by planar positional information; and

video synthesis means for generating synthesized video data on the basis of an output signal from the X-ray topograph and an output signal from the optical image-capturing means.

2. The X-ray diffraction apparatus according to claim 1, wherein

the video synthesis means generates the synthesized video data on the basis of a reference position set for the sample.

3. The X-ray diffraction apparatus according to claim 2, wherein

the reference position is an edge of the sample or a mark provided to the sample.

4. The X-ray diffraction apparatus according to claim 1, wherein

the optical image-capturing means has a semiconductor image sensor in which a plurality of semiconductor X-ray light-receiving circuit elements are lined up in a planar or linear formation.

5. The X-ray diffraction apparatus according to claim 1, wherein

the sample is an optically transparent single crystal substance, surface of which reflects light of small amount.

6. The X-ray diffraction apparatus according to claim 1, further comprising:

an X-ray measurement system for irradiating the sample with an X-ray within a narrower region than the region in which the sample is irradiated with an X-ray in the X-ray topography means, and detecting an X-ray exiting from the sample at this time; and

sample moving means for causing the sample to perform a translational movement.

7. The X-ray diffraction apparatus according to claim 6, wherein

the X-ray measurement system is at least one of a rocking curve measuring device, a reflectometry device, a reciprocal lattice mapping device, an in-plane measuring device, and an X-ray powder diffraction apparatus.

8. The X-ray diffraction apparatus according to claim 6, wherein

the X-ray topography means and the X-ray measurement system have a common X-ray source.

9. The X-ray diffraction apparatus according to claim 3, wherein

the optical image-capturing means has a semiconductor image sensor in which a plurality of semiconductor X-ray light-receiving circuit elements are lined up in a planar or linear formation.

10. The X-ray diffraction apparatus according to claim 9, wherein

the sample is an optically transparent single crystal substance, surface of which reflects light of small amount.

11. The X-ray diffraction apparatus according to claim 10, further comprising:

an X-ray measurement system for irradiating the sample with an X-ray within a narrower region than the region in which the sample is irradiated with an X-ray in the X-ray topography means, and detecting an X-ray exiting from the sample at this time; and

sample moving means for causing the sample to perform a translational movement.

12. The X-ray diffraction apparatus according to claim 11, wherein

the X-ray measurement system is at least one of a rocking curve measuring device, a reflectometry device, a reciprocal lattice mapping device, an in-plane measuring device, and an X-ray powder diffraction apparatus.

13. The X-ray diffraction apparatus according to claim 12, wherein

the X-ray topography means and the X-ray measurement system have a common X-ray source.

14. An X-ray diffraction measurement method for performing a measurement using the X-ray diffraction apparatus according to claim 6, the X-ray diffraction measurement method comprising:

determining the presence of a crystal defect on the basis of an output result from the X-ray topography means;

specifying the position of the crystal defect by the planar positional information on the basis of the synthesized video data determined by the video synthesis means;

moving the sample by the sample moving means on the basis of the specified planar positional information, and causing the crystal defect to move to an X-ray irradiation position in the X-ray measurement system; and

performing measurement by the X-ray measurement system.

15. An X-ray diffraction measurement method for performing a measurement using the X-ray diffraction apparatus according to claim 7, the X-ray diffraction measurement method comprising:

determining the presence of a crystal defect on the basis of an output result from the X-ray topography means;

specifying the position of the crystal defect by the planar positional information on the basis of the synthesized video data determined by the video synthesis means;

moving the sample by the sample moving means on the basis of the specified planar positional information, and causing the crystal defect to move to an X-ray irradiation position in the X-ray measurement system; and

performing measurement by the X-ray measurement system.

16. An X-ray diffraction measurement method for performing a measurement using the X-ray diffraction apparatus according to claim 8, the X-ray diffraction measurement method comprising:

determining the presence of a crystal defect on the basis of an output result from the X-ray topography means;

specifying the position of the crystal defect by the planar positional information on the basis of the synthesized video data determined by the video synthesis means;

moving the sample by the sample moving means on the basis of the specified planar positional information, and causing the crystal defect to move to an X-ray irradiation position in the X-ray measurement system; and

performing measurement by the X-ray measurement system.