METHOD FOR ESTIMATING THE LIFESPAN OF A DEEP-SUB-MICRON INTEGRATED ELECTRONIC CIRCUIT
First Claim
1. Method for estimating the lifetime (TTFAPPLI) of a deep-submicron-generation integrated electronic component, linked to a wear mechanism occurring in previously defined special conditions of use, said component being of a deep submicron type, with very large-scale integration (VLSI), commercially available off the shelf,characterized in that it is assumed that the same sample population always experiences a failure due to:
- the most predominant failure mechanism, during the period of useful life, described by an exponential law,the most critical wear mechanism, represented by a Weibull distribution at the end of the previous period,and in that the method comprises the following steps;
Step 101—
of receiving and storing predefined elements of technical information about the component, in particular the power supply voltage(s), technological data (node, FEOL and BEOL description), the technical description of the encapsulation and the addressing data for the component,Step 106—
of analyzing the component'"'"'s sensitivity with regard to specific conditions of use,Step 116—
of selecting the most critical bottom of the bath and wear mechanisms, and associated accelerated tests.
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Abstract
A large range of commercial VLSI Deep Submicron circuits are used in aeronautics for designs of electronic cards. Due to miniaturization, a continually increasing level of integration and the use of new materials in the foundries, the main failure mechanisms change whilst other ones appear. The lifetimes linked to these failure mechanisms are suspected of being shorter and shorter, so that predicting the lifetime becomes a significant challenge for the reliability of Deep Submicron (DSM) semiconductors. A new approach is proposed here, based on analyzing the technology so as to determine the potential risks to reliability with respect to the specific use of DSM components for avionics applications.
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Citations
16 Claims
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1. Method for estimating the lifetime (TTFAPPLI) of a deep-submicron-generation integrated electronic component, linked to a wear mechanism occurring in previously defined special conditions of use, said component being of a deep submicron type, with very large-scale integration (VLSI), commercially available off the shelf,
characterized in that it is assumed that the same sample population always experiences a failure due to: -
the most predominant failure mechanism, during the period of useful life, described by an exponential law, the most critical wear mechanism, represented by a Weibull distribution at the end of the previous period, and in that the method comprises the following steps; Step 101—
of receiving and storing predefined elements of technical information about the component, in particular the power supply voltage(s), technological data (node, FEOL and BEOL description), the technical description of the encapsulation and the addressing data for the component,Step 106—
of analyzing the component'"'"'s sensitivity with regard to specific conditions of use,Step 116—
of selecting the most critical bottom of the bath and wear mechanisms, and associated accelerated tests. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification