Production of Nanoparticles

• US 20120152735A1
• Filed: 06/30/2010
• Published: 06/21/2012
• Est. Priority Date: 06/17/2009
• Status: Abandoned Application

• Current Assignee: Mantis Deposition Limited (anno 11 GmbH)
• Original Assignee: Mantis Deposition Limited (anno 11 GmbH)
• Inventors: Allers, Lars, Kean, Alistair, Wynne-Powell, Thomas Matthew
• Application Number:
  US13/377,843
• Publication Number:
  US 20120152735A1
• Time in Patent Office: Days
• US Class Current: 204/298.06
• CPC Class Codes: C23C 14/223 specially adapted for coating particles

Abstract

Composite nanoparticles can be produced by a processing apparatus comprising a source of charged, moving nanoparticles or a first material and a first size, apparatus for imposing a like potential in a region lying in the path of the nanoparticles, and a physical vapour deposition source of a second material directed toward the region, thereby to produce nanoparticles of a second and greater size being a composite of the first and second materials. The apparatus for imposing a like potential can comprise one or more conductive rings surrounding the path of the nanoparticles, each at a successively lower potential. The physical vapour deposition source can be one or more of a sputter target, or an evaporative source, or another PVD source. There can be a plurality of physical vapour deposition sources, thereby allowing a larger region in which the shell is deposited. All of the physical vapour deposition sources can deposit the same material, for a uniform shell. Alternatively, different sources could allow for multiple shells or alloy shells.

Claims

1. Apparatus for the processing of nanoparticles, comprising a source of charged, moving nanoparticles of a first material and a first size, apparatus for imposing a like potential in a region lying in the path of the nanoparticles, and a physical vapour deposition source of a second material directed toward the region, thereby to produce nanoparticles of a second and greater size being a composite of the first and second materials.

2. Apparatus according to claim 1 in which the apparatus for imposing a like potential comprises one or more conductive rings surrounding the path of the nanoparticles.

3. Apparatus according to claim 1 in which the like potential decreases from a maximum to a minimum in the direction of travel of the moving nanoparticles.

4. Apparatus according to claim 3 in which the apparatus for imposing a like potential comprises one or more conductive rings surrounding the path of the nanoparticles and in which there are a plurality of conductive rings along the path of the nanoparticles, each at a successively lower potential.

5. Apparatus according to claim 4 in which each of the conductive rings is connected to a neighbouring ring by an electrically resistive element.

6. Apparatus according to claim 5 in which a first conductive ring is connected to a voltage source.

7. Apparatus according to claim 6 in which a last conductive ring is connected to an earth.

8. Apparatus according to claim 1 in which the moving nanoparticles are negatively charged and the imposed potential is negative.

9. Apparatus according to claim 1 in which the physical vapour deposition source is a sputter target.

10. Apparatus according to claim 1 in which the physical vapour deposition source is an evaporative source.

11. Apparatus according to claim 1 in which there is a plurality of physical vapour deposition sources.

12. Apparatus according to claim 11 in which all of the physical vapour deposition sources deposit the same material.

13. (canceled)