Adjustable Capacitor, Plasma Impedance Matching Device, Plasma Impedance Matching Method, And Substrate Treating Apparatus
First Claim
1. A substrate treating apparatus comprising:
- a process chamber;
an electrode configured to generate plasma from a gas supplied into the process chamber;
an RF power supply configured to output an RF power;
a transmission line configured to transmit the RF power to the electrode from the RF power supply;
an impedance matching unit connected to the transmission line and configured to match plasma impedance; and
a controller configured to output a control signal to the impedance matching unit,wherein the impedance matching unit comprises an adjustable capacitor having a plurality of capacitors and a plurality of switches corresponding to the plurality of capacitors, the plurality of switches being switched on/off according to the control signal so that capacitance of the adjustable capacitor is adjusted.
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Accused Products
Abstract
Disclosed is a substrate treating apparatus which comprises a process chamber; an electrode configured to generate plasma from a gas supplied into the process chamber; an RF power supply configured to output an RF power; a transmission line configured to transmit the RF power to the electrode from the RF power supply; an impedance matching unit connected to the transmission line and configured to match plasma impedance; and a controller configured to output a control signal to the impedance matching unit, wherein the impedance matching unit comprises an adjustable capacitor having a plurality of capacitors and a plurality of switches corresponding to the plurality of capacitors, the plurality of switches being switched on/off according to the control signal so that capacitance of the adjustable capacitor is adjusted.
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Citations
30 Claims
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1. A substrate treating apparatus comprising:
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a process chamber; an electrode configured to generate plasma from a gas supplied into the process chamber; an RF power supply configured to output an RF power; a transmission line configured to transmit the RF power to the electrode from the RF power supply; an impedance matching unit connected to the transmission line and configured to match plasma impedance; and a controller configured to output a control signal to the impedance matching unit, wherein the impedance matching unit comprises an adjustable capacitor having a plurality of capacitors and a plurality of switches corresponding to the plurality of capacitors, the plurality of switches being switched on/off according to the control signal so that capacitance of the adjustable capacitor is adjusted. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A plasma impedance matching device comprising:
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an impedance matching unit connected to a transmission line of an RF power and configured to match plasma impedance; and a controller configured to send a control signal to the impedance matching unit, wherein the impedance matching unit comprises an adjustable capacitor having a plurality of capacitors and a plurality of switches corresponding to the plurality of capacitors, the plurality of switches being switched on/off according to the control signal so that capacitance of the adjustable capacitor is adjusted. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. An adjustable capacitor comprising:
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a plurality of capacitors grouped into N groups (N being an integer bigger than
1); anda plurality of switches respectively connected to the plurality of capacitors and controlled according to a control signal, wherein capacitance ranges adjusted by the respective groups are different. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30)
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Specification