SEMICONDUCTOR ELEMENT, HEMT ELEMENT, AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT

• US 20120168771A1
• Filed: 03/08/2012
• Published: 07/05/2012
• Est. Priority Date: 07/29/2010
• Status: Abandoned Application

• Current Assignee: NGK Insulators Limited
• Original Assignee: NGK Insulators Limited
• Inventors: Miyoshi, Makoto, Sumiya, Shigeaki, Ichimura, Mikiya, Sugiyama, Tomohiko, Tanaka, Mitsuhiro
• Application Number:
  US13/415,066
• Publication Number:
  US 20120168771A1
• Time in Patent Office: Days
• US Class Current: 257/76
• CPC Class Codes: H01L 21/28581 Deposition of Schottky electrodes
• CPC Class Codes: H01L 29/2003 Nitride compounds
• CPC Class Codes: H01L 29/475 on AIII-BV compounds
• CPC Class Codes: H01L 29/66462 with a heterojunction interface channel or gate, e.g. HFET, HIGFET, SISFET, HJFET, HEMT
• CPC Class Codes: H01L 29/7786 with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT

Abstract

A semiconductor device is provided such that a reverse leak current is suppressed, and a Schottky junction is reinforced. The semiconductor device includes an epitaxial substrate formed by laminating a group of group-III nitride layers on a base substrate in such a manner that (0001) surfaces of said group-III nitride layers are substantially parallel to a substrate surface, and a Schottky electrode, in which the epitaxial substrate includes a channel layer formed of a first group-III nitride having a composition of In_x1Al_y1Ga_z1N, a barrier layer formed of a second group-III nitride having a composition of In_x2Al_y2N, and a contact layer formed of a third group-III nitride having insularity and adjacent to the barrier layer, and the Schottky electrode is connected to the contact layer. In addition, a heat treatment is performed under a nitrogen atmosphere after the gate electrode has been formed.

Claims

1. A semiconductor device comprising:

an epitaxial substrate, formed by laminating a group of group-III nitride layers on a base substrate in such a manner that (0001) crystal surfaces of said group-III nitride layers are substantially parallel to a substrate surface; and

a Schottky electrode, wherein

said epitaxial substrate comprises;

a channel layer formed of a first group-III nitride having a composition of In_x1Al_y1Ga_z1N (x1+y1+z1=1, z1>

0);

a barrier layer formed of a second group-III nitride having a composition of In_x2Al_y2N (x2+y2=1, x2>

0, y2>

0); and

a contact layer formed of a third group-III nitride being AlN and having insularity and adjacent to said barrier layer,

a film thickness of said contact layer is 0.5 nm to 6 nm, and

said Schottky electrode is connected to said contact layer.

2. The semiconductor device according to claim 1, wherein

a bandgap of said second group-III nitride is larger than a bandgap of said first group-III nitride.

3. The semiconductor device according to claim 1, wherein

a bandgap of said third group-III nitride is larger than the bandgap of said second group-III nitride.

4. The semiconductor device according claim 1, wherein

a Schottky junction between said Schottky electrode and said contact layer has been reinforced by a heat treatment under a nitrogen gas atmosphere.

5. The semiconductor device according to claim 4, comprising an interface layer formed between said Schottky electrode and said contact layer by said heat treatment.

6. The semiconductor device according to claim 5, wherein

said interface layer contains a constituent element of said contact layer and a constituent element of said Schottky electrode.

7. The semiconductor device according to claim 5, wherein

said Schottky electrode contains at least one of Ni, Pt, Pd, and Au, and

said interface layer is formed in such a manner that at least one of Ni, Pt, Pd, and Au is soluble in said third group-III nitride.

8. The semiconductor device according to claim 1, wherein

root-mean-square surface roughness of said contact layer is 0.5 nm or less.

9. The semiconductor device according to claim 1, wherein

said second group-III nitride is In_x2Al_y2N (x2+y2=1, 0.14≦

x2≦

0.24).

10. The semiconductor device according to claim 1, wherein

said first group-III nitride is Al_y1Ga_z1N (y1+z1=1, z1>

0).

11. The semiconductor device according to claim 10, wherein

said first group-III nitride is GaN.

12. The semiconductor device according to claim 10, further comprising a spacer layer formed of a fourth group-III nitride having a composition of In_x4Al_y4Ga_z4N (x4+y4+z4=1, y4>

0) and having a bandgap larger than that of said second group-III nitride, between said channel layer and said barrier layer.

13. The semiconductor device according to claim 12, wherein

said fourth group-III nitride is AlN.

14. The semiconductor device according to claim 1, wherein

an ohmic electrode is connected to the same contact layer for said Schottky electrode.

15. The semiconductor device according to claim 14, wherein

said Schottky electrode is a gate electrode, and said ohmic electrode is a source electrode and a drain electrode.

16. A method of manufacturing a semiconductor device comprising an epitaxial substrate formed by laminating a group of group-III nitride layers on a base substrate in such a manner that (0001) crystal surfaces of said group-III nitride layers are substantially parallel to a substrate surface, and a Schottky electrode, said method comprising:

a channel layer forming step of forming a channel layer with a first group-III nitride having a composition of In_x1Al_y1Ga_z1N (x1+y1+z1=1, z1>

0), on the base substrate;

a barrier layer forming step of forming a barrier layer with a second group-III nitride having a composition of In_x2Al_y2N (x2+y2=1, x2>

0, y2>

0), on said channel layer;

a contact layer forming step of forming a contact layer with a third group-III nitride being AlN and having insularity in a film thickness of 0.5 nm to 6 nm so as to be adjacent to said barrier layer; and

a Schottky electrode forming step of forming the Schottky electrode so as to be connected to said contact layer.

17. The method of manufacturing the semiconductor device according to claim 16, wherein

a bandgap of said second group-III nitride is larger than a bandgap of said first group-III nitride.

18. The method of manufacturing the semiconductor device according to claim 16, wherein

a bandgap of said third group-III nitride is larger than the bandgap of said second group-III nitride.

19. The method of manufacturing the semiconductor device according to claim 16, further comprising

a heat treatment step of performing a heat treatment under a nitrogen gas atmosphere on the semiconductor device in which said Schottky electrode has been connected.

20. The method of manufacturing the semiconductor device according to claim 19, wherein

in said heat treatment step, an interface layer is formed between said Schottky electrode and said contact layer.

21. The method of manufacturing the semiconductor device according to claim 20, wherein

said interface layer contains a constituent element of said contact layer and a constituent element of said Schottky electrode.

22. The method of manufacturing the semiconductor device according to claim 20, wherein

in said Schottky electrode forming step, said Schottky electrode is formed so as to contain at least one of Ni, Pt, Pd, and Au, and

in said heat treatment step, said interface layer is formed in such a manner that at least one of Ni, Pt, Pd, and Au is soluble in said third group-III nitride.

23. The method of manufacturing the semiconductor device according to claim 16, wherein

said second group-III nitride is In_x2Al_y2N (x2+y2=1, 0.14≦

x2≦

0.24).

24. The method of manufacturing the semiconductor device according to claim 16, wherein

said first group-III nitride is Al_y1Ga_z1N (y1+z1=1, z1>

0).

25. The method of manufacturing the semiconductor device according to claim 24, wherein

said first group-III nitride is GaN.

26. The method of manufacturing the semiconductor device according to claim 24, further comprising a spacer layer forming step of forming a spacer layer with a fourth group-III nitride having a composition of In_x4Al_y4Ga_z4N (x4+y4+z4=1, y4>

0) and having a bandgap larger than that of said second group-III nitride, between said channel layer and said barrier layer.

27. The method of manufacturing the semiconductor device according to claim 26, wherein

said fourth group-III nitride is AlN.

28. The method of manufacturing the semiconductor device according to claim 16, further comprising an ohmic electrode forming step of forming an ohmic electrode so as to be connected to said contact layer having said Schottky electrode thereon.