Multi-Layer Single Crystal 3D Stackable Memory
First Claim
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1. A method for manufacturing a memory device, the method comprising:
- bonding a first single crystal semiconductor body to a surface of a first layer of insulating material, and splitting the first single crystal semiconductor body on a plane generally parallel to the surface of the first layer of insulating material, leaving a first layer of single crystal semiconductor bonded on the first layer of insulating material;
forming a second layer of insulating material on the first layer of single crystal semiconductor material;
bonding a second single crystal semiconductor body to a surface of the second layer of insulating material, and splitting the second single crystal semiconductor body on a plane generally parallel to the surface of the second layer of insulating material, leaving a second layer of single crystal semiconductor bonded on the second layer of insulating material; and
processing the first and second layers of single crystal semiconductor layer to form a 3D memory array.
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Abstract
Technology is described herein for manufacturing a three-dimensional 3D stacked memory structure having multiple layers of single crystal silicon or other semiconductor. The multiple layers of single crystal semiconductor are suitable for implementing multiple levels of high performance memory cells.
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Citations
25 Claims
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1. A method for manufacturing a memory device, the method comprising:
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bonding a first single crystal semiconductor body to a surface of a first layer of insulating material, and splitting the first single crystal semiconductor body on a plane generally parallel to the surface of the first layer of insulating material, leaving a first layer of single crystal semiconductor bonded on the first layer of insulating material; forming a second layer of insulating material on the first layer of single crystal semiconductor material; bonding a second single crystal semiconductor body to a surface of the second layer of insulating material, and splitting the second single crystal semiconductor body on a plane generally parallel to the surface of the second layer of insulating material, leaving a second layer of single crystal semiconductor bonded on the second layer of insulating material; and processing the first and second layers of single crystal semiconductor layer to form a 3D memory array. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method for manufacturing a memory device, the method comprising:
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forming a plurality of stacked layers of single crystal semiconductor material, wherein forming each particular layer of single crystal semiconductor material in the plurality comprises bonding a single crystal semiconductor body to a layer of insulating material, and splitting the single crystal semiconductor body such that the particular layer of the single crystal semiconductor material remains on the layer of the insulating material; etching the plurality of layers to define a plurality of stacks of single crystal semiconductor material strips; forming a plurality of conductive lines overlying the plurality of stacks, such that a 3D array of interface regions is established at cross-points between surfaces of the single crystal semiconductor material strips and the plurality of conductive lines; and forming memory elements in the interface regions, which establish a 3D array of memory cells accessible via the plurality of single crystal semiconductor material strips and the plurality of conductive lines.
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14. A memory device manufactured by a method comprising:
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bonding a first single crystal semiconductor body to a surface of a first layer of insulating material, and splitting the first single crystal semiconductor body on a plane generally parallel to the surface of the first layer of insulating material, leaving a first layer of single crystal semiconductor bonded on the first layer of insulating material; forming a second layer of insulating material on the first layer of single crystal semiconductor material; bonding a second single crystal semiconductor body to a surface of the second layer of insulating material, and splitting the second single crystal semiconductor body on a plane generally parallel to the surface of the second layer of insulating material, leaving a second layer of single crystal semiconductor bonded on the second layer of insulating material; and processing the first and second layers of single crystal semiconductor layer to form a 3D memory array. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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Specification