METHOD FOR RECYCLING A SOURCE SUBSTRATE
First Claim
1. A process for recycling a source substrate comprising a surface region and regions in relief on the surface region, with the regions in relief corresponding to residual regions of a layer of the source substrate that were not separated from the rest of the source substrate during a prior removal step, implementing cleavage at a weakened zone formed by damaged material of the source substrate, wherein the surface region corresponds to part of the weakened zone not separated from the rest of the source substrate during the prior removal step, wherein the recycling process comprises applying selective electromagnetic irradiation to the source substrate at a wavelength such that the damaged material of the surface region absorbs the electromagnetic irradiation to facilitate selective removal of the regions in relief.
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Abstract
The present invention relates to process for recycling a source substrate that has a surface region and regions in relief on the surface region, with the regions in relief corresponding to residual regions of a layer of the source substrate that were not being separated from the rest of the source substrate during a prior removal step. The process includes selective electromagnetic irradiation of the source substrate at a wavelength such that the damaged material of the surface region absorbs the electromagnetic irradiation. The present invention also relates to a recycled source substrate and to a process for transferring a layer from a source substrate recycled for this purpose.
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Citations
21 Claims
- 1. A process for recycling a source substrate comprising a surface region and regions in relief on the surface region, with the regions in relief corresponding to residual regions of a layer of the source substrate that were not separated from the rest of the source substrate during a prior removal step, implementing cleavage at a weakened zone formed by damaged material of the source substrate, wherein the surface region corresponds to part of the weakened zone not separated from the rest of the source substrate during the prior removal step, wherein the recycling process comprises applying selective electromagnetic irradiation to the source substrate at a wavelength such that the damaged material of the surface region absorbs the electromagnetic irradiation to facilitate selective removal of the regions in relief.
- 20. In a process for recycling a source substrate that has been used to supply a layer of surface material by a layer detachment and transfer process and which contains regions in relief relative to the detachment surface which regions include non-transferred zones of damaged material present on the surface of the source substrate, the improvement which comprises providing selective electromagnetic irradiation of the source substrate at a wavelength such that the damaged material of the surface regions in relief absorbs the electromagnetic irradiation to facilitate selective removal of such regions to thus facilitate recycling of the source substrate.
Specification