SUBSTRATE WITH ANTIREFLECTION COATING AND METHOD FOR PRODUCING SAME

• US 20120212826A1
• Filed: 02/23/2012
• Published: 08/23/2012
• Est. Priority Date: 02/23/2011
• Status: Active Grant

• Current Assignee: Schott AG (Carl-Zeiss-Stiftung)
• Original Assignee: Schott AG (Carl-Zeiss-Stiftung)
• Inventors: HENN, CHRISTIAN, DAMM, THORSTEN
• Granted Patent: US 9,296,648 B2
• Time in Patent Office: Days
• US Class Current: 359/586
• CPC Class Codes: C03C 17/3435 comprising a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 2217/734 comprising an alternation of high and low refractive indexes
• CPC Class Codes: C03C 2217/77 Coatings having a rough surface
• CPC Class Codes: C23C 14/08 Oxides C23C14/10 takes precedence
• CPC Class Codes: C23C 14/185 by cathodic sputtering
• CPC Class Codes: C23C 14/3485 using pulsed power to the target
• CPC Class Codes: C23C 14/35 by application of a magnetic field, e.g. magnetron sputtering C23C14/3457 takes precedence
• CPC Class Codes: G02B 1/115 Multilayers
• CPC Class Codes: G02B 1/116 including electrically conducting layers
• CPC Class Codes: H01J 37/3467 Pulsed operation, e.g. HIPIMS

Abstract

A substrate is provided with an abrasion resistance antireflection coating. The coated substrate includes a multilayer antireflection coating on at least one side. The coating has layers with different refractive indices, wherein higher refractive index layers alternate with lower refractive index layers. The layers having a lower refractive index are formed of silicon oxide with a proportion of aluminum, with a ratio of the amounts of aluminum to silicon is greater than 0.05, preferably greater than 0.08, but with the amount of silicon predominant relative to the amount of aluminum. The layers having a higher refractive index include a silicide, an oxide, or a nitride.

Claims

1. A coated substrate comprising:

a substrate; and

a multilayer antireflection coating on at least one side of the substrate, the multilayer antireflection coating comprising layers having a higher refractive index alternated with layers having a lower refractive index, wherein the layers having a lower refractive index are formed of silicon oxide with a proportion of aluminum and have a first ratio of an amount of aluminum to an amount of silicon that is greater than 0.05, but with the amount of silicon being predominant relative to the amount of aluminum, and wherein the layers having a higher refractive index include a material selected from the group consisting of a silicide, an oxide, and a nitride.

2. The coated substrate as claimed in claim 1, wherein the first ratio is greater than 0.08.

3. The coated substrate as claimed in claim 1, wherein the layers having a higher refractive index comprise silicon nitride with a proportion of aluminum and have a second ratio of an amount of aluminum to an amount of silicon that is greater than 0.05.

4. The coated substrate as claimed in claim 3, wherein the second ratio is greater than 0.08.

5. The coated substrate as claimed in claim 1, wherein the antireflection coating has an upper surface formed by a lower refractive index layer of silicon oxide with a proportion of aluminum.

6. The coated substrate as claimed in claim 1, wherein the antireflection coating has a total coating thickness ranging from 200 to 400 nm.

7. The coated substrate as claimed in claim 1, wherein the antireflection coating has an upper surface with an average roughness and a root mean squared roughness of less than 1.5 nm each, based on an area of one square micrometer.

8. The coated substrate as claimed in claim 1, wherein the antireflection coating comprises at least two layers having a higher refractive index and at least two layers having a lower refractive index.

9. The coated substrate as claimed in claim 8, wherein the antireflection coating comprises a stack of four successive layers having a bottom layer, a first layer on the bottom layer, a second layer on the first layer, and a top layer on the second layer,

the bottom layer being a silicon nitride-containing higher refractive index layer,

the first layer being a lower refractive index layer of silicon oxide with a proportion of aluminum,

the second layer being a silicon nitride-containing higher refractive index layer having a layer thickness that is the largest of the four successive layers within the stack,

the top layer being a lower refractive index layer of silicon oxide with a proportion of aluminum and having a layer thickness that is the second largest of the four successive layers within the stack, and

wherein the bottom layer and the first layer have a combined layer thickness which is thinner than the layer thickness of the top layer.

10. The coated substrate as claimed in claim 9, further comprising an aluminum-containing silicon oxide layer deposited on the substrate, and the stack of four successive layers being deposited on the aluminum-containing silicon oxide layer.

11. The coated substrate as claimed in claim 1, wherein the substrate is a material selected from the group consisting of glass, glass ceramic, sapphire glass panel, synthetic quartz glass substrate, crystal, optical glass, and filter glass.

12. The coated substrate as claimed in claim 1, wherein the substrate has a curved surface that is coated with the antireflection coating.

13. The coated substrate as claimed in claim 12, wherein the curved surface comprises a lenticular surface of the substrate.

14. A method for producing a coated substrate, comprising:

depositing a multilayer antireflection coating to at least one side of a substrate, the coating comprising successively deposited layers having different refractive indices, with layers having a higher refractive index alternating with layers having a lower refractive index,

wherein the layers having the lower refractive index are formed of silicon oxide with a proportion of aluminum and a ratio of aluminum to silicon that is greater than 0.05, but with an amount of silicon predominant relative to an amount of aluminum, and

wherein the layers having the higher refractive index comprise a material selected from the group consisting of silicide, oxide, and nitride.

15. The method as claimed in claim 14, wherein the ratio is greater than 0.08.

16. The method as claimed in claim 14, wherein the step of depositing comprises sputtering.

17. The method as claimed in claim 14, wherein the step of depositing comprises magnetron sputtering with a pulsed field exciting of a plasma and having a power density of at least 100 watts per square centimeter of a target surface.

18. The method as claimed in claim 17, wherein the plasma is maintained in intervals between pulses.