SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD

• US 20120216828A1
• Filed: 05/17/2010
• Published: 08/30/2012
• Est. Priority Date: 10/27/2009
• Status: Abandoned Application

• Current Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Original Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Inventors: Kohno, Akihiko, Tanaka, Junichi
• Application Number:
  US13/504,242
• Publication Number:
  US 20120216828A1
• Time in Patent Office: Days
• US Class Current: 134/1
• CPC Class Codes: B08B 2203/005 the liquid being ozonated
• CPC Class Codes: B08B 3/022 Cleaning travelling work B08B3/042 takes precedence
• CPC Class Codes: G03F 7/423 containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
• CPC Class Codes: H01L 21/67051 using mainly spraying means, e.g. nozzles
• CPC Class Codes: H01L 27/1259 Multistep manufacturing methods

Abstract

Disclosed is a substrate cleaning device provided with: a generation unit that generates ozone micro-nanobubble water; a nozzle header unit provided with a plurality of spray nozzles that spray the ozone micro-nanobubble water; and a substrate support unit that supports a substrate to be treated. The surface of the substrate supported by the substrate support unit is cleaned by spraying the ozone micro-nanobubble water from the plurality of spray nozzles onto the substrate.

Claims

1. A substrate cleaning device, comprising:

a generation unit that generates ozone micro-nanobubble water that is a liquid containing ozone micro-nanobubbles;

a nozzle header unit having a plurality of spray nozzles that spray the ozone micro-nanobubble water supplied from said generation unit; and

a substrate support unit that supports a substrate to be treated such that the substrate faces said nozzle header unit,

wherein said plurality of spray nozzles of said nozzle header unit spray said ozone micro-nanobubble water onto a substrate to be treated, which is supported by said substrate support unit, to clean a surface of said substrate to be treated.

2. The substrate cleaning device according to claim 1,

wherein said plurality of spray nozzles are arranged in a zigzag shape in said nozzle header unit.

3. The substrate cleaning device according to claim 1,

wherein said substrate support unit moves said substrate to be treated in a prescribed direction while maintaining a constant distance between said substrate to be treated and said nozzle header unit.

4. The substrate cleaning device according to claim 3,

wherein said plurality of spray nozzles spray said ozone micro-nanobubble water onto a surface of said substrate to be treated in an oblique direction inclined to a side opposite to a moving direction of said substrate to be treated.

5. The substrate cleaning device according to claim 1, further comprising a UV light irradiation unit that irradiates said substrate to be treated with UV light,

wherein said nozzle header unit sprays said ozone micro-nanobubble water onto a substrate to be treated, which has been irradiated with UV light by said UV light irradiation unit.

6. The substrate cleaning device according to claim 1,

wherein a patterned resist is formed on a surface of said substrate to be treated facing said nozzle header unit,

wherein said resist is stripped by said ozone micro-nanobubble water sprayed from said plurality of spray nozzles.

7. A substrate cleaning method, comprising spraying ozone micro-nanobubble water via a plurality of spray nozzles provided in a nozzle header unit onto a substrate to be treated to clean a surface of said substrate to be treated, the ozone micro-nanobubble water being a liquid containing ozone micro-nanobubbles.

8. The substrate cleaning method according to claim 7, comprising

moving said substrate to be treated in a prescribed direction while maintaining a constant distance between said substrate to be treated and said nozzle header unit, and spraying said ozone micro-nanobubble water via said plurality of spray nozzles onto the surface of said substrate to be treated in an oblique direction inclined to a side opposite to a moving direction of said substrate to be treated.

9. The substrate cleaning method according to claim 7,

wherein said plurality of spray nozzles spray said ozone micro-nanobubble water onto a substrate to be treated that has been irradiated with UV light.

10. The substrate cleaning method according to claim 7,

wherein a resist that is formed and patterned on a surface of said substrate to be treated is stripped by said ozone micro-nanobubble water sprayed from said plurality of spray nozzles.