METHOD OF CALCULATING MODEL PARAMETERS OF A SUBSTRATE, A LITHOGRAPHIC APPARATUS AND AN APPARATUS FOR CONTROLLING LITHOGRAPHIC PROCESSING BY A LITHOGRAPHIC APPARATUS
First Claim
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1. A method of calculating model parameters of a substrate in an apparatus, the method comprising:
- measuring locations of marks on the substrate in the apparatus;
using measured locations of the marks to generate radial basis functions; and
,calculating model parameters of said substrate in said apparatus using the generated radial basis functions as a basis function across said substrate.
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Abstract
Estimating model parameters of a lithographic apparatus and controlling lithographic processing by a lithographic apparatus includes performing an exposure using a lithographic apparatus projecting a pattern onto a wafer. A set of predetermined wafer measurement locations is measured. Predetermined and measured locations of the marks are used to generate radial basis functions. Model parameters of said substrate are calculated using the generated radial basis functions as a basis function across said substrate. Finally, the estimated model parameters are used to control the lithographic apparatus in order to expose the substrate.
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15 Claims
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1. A method of calculating model parameters of a substrate in an apparatus, the method comprising:
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measuring locations of marks on the substrate in the apparatus; using measured locations of the marks to generate radial basis functions; and
,calculating model parameters of said substrate in said apparatus using the generated radial basis functions as a basis function across said substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A lithographic apparatus arranged to perform a lithographic process across a substrate and to control the lithographic process, said apparatus comprising a processor which is configured and arranged to:
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receive measurement locations of marks on the substrate in the lithographic apparatus;
use measured mark locations to generate radial basis functions;calculate model parameters of said substrate in said lithographic apparatus using said radial basis functions as a basis function across said substrate; and
,control the lithographic process by said lithographic apparatus using said model parameters. - View Dependent Claims (15)
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14. An apparatus arranged to control lithographic processing by a lithographic apparatus and to perform a lithographic process across a substrate, said apparatus comprising a processor which is configured and arranged to:
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receive measurement locations of marks on the substrate in said apparatus;
use measured mark locations to generate radial basis functions;calculate model parameters of said substrate in said apparatus using said radial basis functions as a basis function across said substrate; and
,control the lithographic process by said lithographic apparatus using said model parameters.
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Specification