METHOD FOR FABRICATING IMAGE SENSOR
First Claim
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1. A method of fabricating an image sensor, comprising:
- providing a substrate of the image sensor;
forming on the substrate a plurality of photoresist patterns arranged in a first array, wherein a top view of each photoresist pattern has a substantially square shape and a distance between two neighboring photoresist patterns decreases from a center of the first array toward an edge of the first array; and
performing a thermal reflow step to convert the photoresist patterns into a plurality of microlenses arranged in a second array.
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Abstract
A method for fabricating an image sensor is provided. A substrate is provided, and then a plurality of photoresist patterns is formed on the substrate. The photoresist patterns are arranged in a first array, wherein a top view of each photoresist pattern has a substantially square shape and a distance between two neighboring photoresist patterns decreases from a center of the first array toward an edge of the first array. Then, a thermal reflow step is performed to convert the photoresist patterns into a plurality of microlenses arranged in a second array.
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Citations
9 Claims
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1. A method of fabricating an image sensor, comprising:
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providing a substrate of the image sensor; forming on the substrate a plurality of photoresist patterns arranged in a first array, wherein a top view of each photoresist pattern has a substantially square shape and a distance between two neighboring photoresist patterns decreases from a center of the first array toward an edge of the first array; and performing a thermal reflow step to convert the photoresist patterns into a plurality of microlenses arranged in a second array. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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Specification