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PRESSURE CONTROLLING APPARATUS

  • US 20120227830A1
  • Filed: 03/09/2012
  • Published: 09/13/2012
  • Est. Priority Date: 03/11/2011
  • Status: Active Grant
First Claim
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1. A pressure controlling apparatus that controls pressure of a processing gas in a processing chamber of a plasma processing apparatus that generates plasma from a processing gas introduced into the processing chamber and processes a processing target substrate, the pressure controlling apparatus comprising:

  • a detecting unit that detects pressure of a processing gas in the processing chamber;

    an exhaust pipe that is communicated with the processing chamber and has a central axis passing a center of the processing chamber;

    a regulating valve arranged in the exhaust pipe; and

    a pressure controlling unit that controls the regulating valve so that pressure detected by the detecting unit matches a target value, whereinthe regulating valve includesa valve port communicated with the exhaust pipe,a changing unit that changes a shape of the valve port to a different shape whose center is located near the central axis of the exhaust pipe, anda slide valve that regulates an opening degree of the valve port changed by the changing unit, andthe pressure controlling unit controls changing of a shape of the valve port by the changing unit and regulation of an opening degree of the valve port by the slide valve.

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