MICROCHIP AND SOI SUBSTRATE FOR MANUFACTURING MICROCHIP
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Accused Products
Abstract
A plasma treatment or an ozone treatment is applied to the respective bonding surfaces of the single-crystal Si substrate in which the ion-implanted layer has been formed and the quartz substrate, and the substrates are bonded together. Then, a force of impact is applied to the bonded substrate to peel off a silicon thin film from the bulk portion of single-crystal silicon along the hydrogen ion-implanted layer, thereby obtaining an SOI substrate having an SOI layer on the quartz substrate. A concave portion, such as a hole or a micro-flow passage, is formed on a surface of the quartz substrate of the SOI substrate thus obtained, so that processes required for a DNA chip or a microfluidic chip are applied. A silicon semiconductor element for the analysis/evaluation of a sample attached/held to this concave portion is formed in the SOI layer.
12 Citations
20 Claims
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1-10. -10. (canceled)
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11. A chip comprising a semiconductor element for fluorescence/absorbed light analysis wherein said microchip is fabricated using an SOI substrate manufactured by a method comprising:
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(1) forming a hydrogen ion-implanted layer by implanting ions into the bonding surface of a silicon substrate; (2) applying a surface activation treatment to the bonding surface of at least one of said silicon substrate and said glass substrate; (3) bonding together said silicon substrate and said glass substrate; and (4) transferring a silicon layer onto said glass substrate by peeling off the surface layer of said silicon substrate along said hydrogen ion-implanted layer. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification