INSPECTION DEVICE

• US 20120235036A1
• Filed: 03/15/2012
• Published: 09/20/2012
• Est. Priority Date: 03/15/2011
• Status: Active Grant

• Current Assignee: Ebara Corporation
• Original Assignee: Ebara Corporation
• Inventors: Hatakeyama, Masahiro, Yoshikawa, Shoji, Murakami, Takeshi, Watanabe, Kenji, Naito, Yoshihiko, Toma, Yasushi, Karimata, Tsutomu, Hayashi, Takehide, Tsukamoto, Kiwamu, Kohama, Tatsuya, Kobayashi, Noboru
• Granted Patent: US 8,497,476 B2
• Time in Patent Office: Days
• US Class Current: 250/310
• CPC Class Codes: G01N 2223/611 patterned objects; electronic devices
• CPC Class Codes: G01N 23/223 by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
• CPC Class Codes: G01N 23/2251 using incident electron beams, e.g. scanning electron microscopy [SEM]
• CPC Class Codes: H01J 1/34 Photo-emissive cathodes H01J1/35 takes precedence
• CPC Class Codes: H01J 2237/0048 Charging arrangements
• CPC Class Codes: H01J 2237/022 Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
• CPC Class Codes: H01J 2237/032 Mounting or supporting
• CPC Class Codes: H01J 2237/038 Insulating
• CPC Class Codes: H01J 2237/045 Diaphragms
• CPC Class Codes: H01J 2237/0458 movable, i.e. for changing between differently sized apertures
• CPC Class Codes: H01J 2237/0473 accelerating
• CPC Class Codes: H01J 2237/0492 Lens systems individual lenses H01J2237/10
• CPC Class Codes: H01J 2237/061 Construction
• CPC Class Codes: H01J 2237/06333 Photo emission
• CPC Class Codes: H01J 2237/166 Sealing means
• CPC Class Codes: H01J 2237/186 Valves
• CPC Class Codes: H01J 2237/2002 Controlling environment of sample
• CPC Class Codes: H01J 2237/2007 Holding mechanisms
• CPC Class Codes: H01J 2237/2008 specially adapted for studying electrical or magnetical properties of objects
• CPC Class Codes: H01J 2237/2448 Secondary particle detectors
• CPC Class Codes: H01J 2237/2482 : Optical means
• CPC Class Codes: H01J 2237/2485 : Electric or electronic means
• CPC Class Codes: H01J 2237/2817 : Pattern inspection
• CPC Class Codes: H01J 2237/2855 : Photo-emission
• CPC Class Codes: H01J 2237/2857 : Particle bombardment induced emission
• CPC Class Codes: H01J 37/073 : Electron guns using field emission, photo emission, or secondary emission electron sources
• CPC Class Codes: H01J 37/09 : Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
• CPC Class Codes: H01J 37/10 : Lenses
• CPC Class Codes: H01J 37/20 : Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support introducing the objects H01J37/18
• CPC Class Codes: H01J 37/222 : Image processing arrangements associated with the tube image data processing or generation, in general G06T
• CPC Class Codes: H01J 37/244 : Detectors; Associated components or circuits therefor
• CPC Class Codes: H01J 37/265 : Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
• CPC Class Codes: H01J 37/28 : with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence
• CPC Class Codes: H01J 37/29 : Reflection microscopes

Abstract

An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Claims

1. An inspection device for inspecting a surface of an inspection object using a beam comprising:

a beam generator which is capable of generating one of either charge particles or an electromagnetic wave as a beam;

a primary optical system which is capable of guiding and irradiating the beam to the inspection object supported within a working chamber;

a secondary optical system which is capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture;

an image processing system which is capable of forming an image based on the secondary charge particles detected by the first detector; and

a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

2. The inspection device according to claim 1, wherein the first detector detects the secondary charge particles in a state where the location of the first movable numerical aperture is adjusted based on a detection result of the second detector.

3. The inspection device according to claim 1 wherein the beam is a beam of charged particles, the beam generator further comprising:

a photoelectron element formed by coating a photoelectron material on a planar part of a base material comprised from a transmittance part including the planar part, the photoelectron element receiving light irradiated from the photoelectron material to generate photoelectrons;

one or more lenses each arranged at a predetermined intervals after the photoelectron element respectively, the one or more lenses accelerating photoelectrons generated from the photoelectron element;

a second numerical aperture arranged on the lower side of the one or more lenses; and

a cathode lens arranged on the lower side of the numerical aperture.

4. The inspection device according to claim 1 wherein the beam is an electromagnetic wave beam, the beam generator generating a plurality of beams with different wavelengths.

5. The inspection device according to claim 1 wherein the first detector detects the secondary charge particles generated from a surface of the inspection object irradiated with the beam.

6. The inspection device according to claim 1 wherein the first detector detects the secondary charge particles generated from a surface opposite a surface of the inspection object irradiated with the beam.

7. The inspection device according to claim 1 wherein the first detector includes a TDI.

8. The inspection device according to claim 1 wherein the second detector includes an EB-CDD.

9. The inspection device according to claim 1 wherein the first movable numerical aperture includes an open part formed by a plus shape or slit.

10. The inspection device according to claim 1 further comprising:

an optical microscope and a SEM (scanning type electron microscope) which observes the inspection object;

wherein

the beam generator, the primary optical system, the secondary optical system, the image processing system, the optical microscope and the SEM are arranged in the working chamber.