FLUID DISTRIBUTION MEMBERS AND/OR ASSEMBLIES
First Claim
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1. A fluid distribution member assembly for use in a substrate processing system, comprising:
- a fluid distribution member having a central portion and a perimeter portion, wherein the fluid distribution member defines at least one slot formed there-through, and wherein the at least one slot extends along a non-radial path configured to allow the central portion to expand and rotate with respect to the perimeter portion.
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Abstract
A fluid distribution member assembly for use in a substrate processing system includes a fluid distribution member having a central portion and a perimeter portion. The fluid distribution member defines at least one slot formed there-through and the at least one slot extends along a non-radial path configured to allow the central portion to expand and rotate with respect to the perimeter portion.
43 Citations
31 Claims
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1. A fluid distribution member assembly for use in a substrate processing system, comprising:
a fluid distribution member having a central portion and a perimeter portion, wherein the fluid distribution member defines at least one slot formed there-through, and wherein the at least one slot extends along a non-radial path configured to allow the central portion to expand and rotate with respect to the perimeter portion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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26. A substrate processing apparatus, comprising:
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a process chamber in which a work-piece can be treated with plasma, gas, or liquid; and at least one fluid distribution member disposed within the process chamber and configured to distribute the plasma, gas, or liquid to the work-piece, wherein the at least one fluid distribution member comprises a central portion and a perimeter portion, wherein the at least one fluid distribution member defines at least one slot formed there-through, and wherein the at least one slot extends along a non-radial path configured to allow the central portion to expand and rotate with respect to the perimeter portion. - View Dependent Claims (27, 28, 29, 30)
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31. A method for plasma processing a substrate, the method comprising
generating a reduced ion density plasma in a plasma generator; -
directing the reduced ion density plasma through a fluid distribution member, the fluid distribution member comprising a central portion and a perimeter portion, said fluid distribution member defining at least one slot formed there-through, wherein the at least one slot extends along a non-radial path configured to allow the central portion to expand and rotate with respect to the perimeter portion; and exposing a work-piece to the reduced ion density plasma.
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Specification