METHOD OF DEPOSITING ZINC OXIDE COATINGS BY CHEMICAL VAPOR DEPOSITION

• US 20120240634A1
• Filed: 03/22/2012
• Published: 09/27/2012
• Est. Priority Date: 03/23/2011
• Status: Abandoned Application

• Current Assignee: Pilkington Group Limited (Nippon Sheet Glass Company Limited)
• Original Assignee: Pilkington Group Limited (Nippon Sheet Glass Company Limited)
• Inventors: Sanderson, Kevin D., Soubeyrand, Michel J., Nelson, Douglas M., Seto, Yasunori, Tsuri, Keiko
• Application Number:
  US13/426,689
• Publication Number:
  US 20120240634A1
• Time in Patent Office: Days
• US Class Current: 65/60.5
• CPC Class Codes: C03C 17/002 for flat glass, e.g. float glass
• CPC Class Codes: C03C 17/245 by deposition from the vapour phase
• CPC Class Codes: C03C 2217/216 ZnO
• CPC Class Codes: C03C 2218/1525 by atmospheric CVD
• CPC Class Codes: C23C 16/407 of zinc, germanium, cadmium, indium, tin, thallium or bismuth
• CPC Class Codes: C23C 16/45574 Nozzles for more than one gas
• CPC Class Codes: C23C 16/4558 Perforated rings
• CPC Class Codes: C23C 16/545 for coating elongated substrates

Abstract

A chemical vapor deposition process for depositing zinc oxide coatings is provided. The process includes providing a glass substrate and a coating apparatus. The coating apparatus includes two or more separate flow pathways. Each flow pathway provides communication between an inlet opening and an outlet opening, and one or more flow conditioners disposed in each of the flow pathways. Gaseous precursor compounds are provided. The gaseous precursor compounds and the one or more inert gases are introduced as two or more streams into the inlet openings. The streams are directed through the two or more separate flow pathways and discharged from the outlet openings of the coating apparatus. The gaseous precursor compounds and one or more inert gases mix to form a zinc oxide coating on a surface of the glass substrate.

Claims

1. A chemical vapor deposition process for depositing a zinc oxide coating comprising:

providing a glass substrate at a temperature above 1112°

F. (600°

C.);

providing a coating apparatus above the glass substrate, wherein the coating apparatus comprises two or more separate flow pathways, each flow pathway providing communication between an inlet opening and an outlet opening, and one or more flow conditioners disposed in each of the flow pathways;

providing gaseous precursor compounds including a gaseous zinc-containing compound, a gaseous oxygen-containing compound, and a gaseous acetonate compound and one or more inert gases;

introducing the gaseous precursor compounds and the one or more inert gases as two or more streams into the inlet openings;

directing the streams through the two or more separate flow pathways; and

discharging the streams from the outlet openings of the coating apparatus, wherein mixing of the gaseous precursor compounds and one or more inert gases occurs to form a zinc oxide coating on a surface of the glass substrate.

2. The process for depositing the zinc oxide coating defined in claim 1, wherein the gaseous zinc-containing compound is an alkyl zinc compound.

3. The process for depositing the zinc oxide coating defined in claim 1, wherein a stream comprising the gaseous zinc-containing compound is introduced into at least one flow pathway and a stream comprising the gaseous oxygen-containing compound is introduced into at least one separate flow pathway.

4. The process for depositing the zinc oxide coating defined in claim 1, wherein the zinc oxide coating is a pyrolytic coating and the glass substrate is moving when the zinc oxide coating is formed.

5. The process for depositing the zinc oxide coating defined in claim 1, wherein the acetonate compound is acetyl acetonate.

6. The process for depositing the zinc oxide coating defined in claim 1, further comprising directing each stream through the one or more flow conditioners to increase the laminarity of each stream.

7. The process for depositing the zinc oxide coating defined in claim 1, wherein the zinc oxide coating is formed on a glass ribbon in a float glass manufacturing process at essentially atmospheric pressure.

8. The process for depositing the zinc oxide coating defined in claim 1, wherein a stream comprises at least one gaseous dopant compound.

9. The process for depositing the zinc oxide coating defined in claim 1, wherein the glass substrate is at a temperature of between 1112°

F. (600°

C.) and 1346°

F. (730°

C.).

10. The process for depositing the zinc oxide coating defined in claim 1, further comprising selectively maintaining predetermined portions of the coating apparatus at a temperature within + or −

50°

F. (10°

C.) of a predetermined set point temperature.

11. The process for depositing the zinc oxide coating defined in claim 1, wherein the coating apparatus comprises a main body which partially defines at least two flow pathways of the two or more separate flow pathways and at least one exhaust gas passage.

12. The process for depositing the zinc oxide coating defined in claim 1, wherein a stream comprising the gaseous zinc-containing compound and gaseous acetonate compound and a stream comprising the gaseous oxygen-containing compound are introduced into separate flow pathways in the coating apparatus.

13. The process for depositing the zinc oxide coating defined in claim 2, wherein the oxygen-containing compound is water.

14. The process for depositing the zinc oxide coating defined in claim 2, wherein the oxygen-containing compound is one selected from the group consisting of carbon dioxide, nitric oxide, nitrogen dioxide, nitrous oxide, oxygen and mixtures thereof.

15. The process for depositing the zinc oxide coating defined in claim 4, wherein the one or more inert gases are selected from the group consisting of nitrogen, hydrogen, helium and mixtures thereof.

16. The process for depositing the zinc oxide coating defined in claim 8, wherein the at least one gaseous dopant compound is a gallium-containing compound.

17. The process for depositing the zinc oxide coating defined in claim 8, wherein the at least one gaseous dopant compound is an aluminum-containing compound.

18. The process for depositing the zinc oxide coating defined in claim 17, wherein the stream comprising the gaseous gallium-containing compound further comprises gaseous HCl.

19. A chemical vapor deposition process for depositing a zinc oxide coating comprising:

providing a moving heated glass substrate supported on a bath of molten metal in a float glass manufacturing process and at essentially atmospheric pressure;

providing a coating apparatus at, at least, one predetermined location in the float bath chamber, and at a predetermined distance above the moving heated glass substrate;

providing a source of a gaseous zinc-containing compound, a gaseous oxygen-containing compound, one or more inert gases, and gaseous acetyl acetonate;

introducing a gaseous stream comprising the gaseous zinc-containing compound into a first flow pathway in the coating apparatus;

introducing a gaseous stream comprising the gaseous oxygen-containing compound into a second flow pathway in the coating apparatus;

introducing a gaseous stream comprising the one or more inert gases into a third flow pathway in the coating apparatus;

introducing the gaseous acetyl acetonate into a flow pathway in the coating apparatus;

maintaining the streams of gaseous compounds/inert gases separate while each flows through a flow conditioner at a predetermined flow velocity to increase the laminarity of each gaseous stream; and

discharging the separate streams of gaseous compounds/inert gases from each flow conditioner, wherein mixing of the separate streams of gaseous compounds/inert gases occurs to form a pyrolytic zinc oxide coating on a surface of the glass substrate.

20. The process for depositing the zinc oxide coating defined in claim 19, wherein the zinc oxide coating is formed at a deposition rate of at least 50 nm/second on the surface of the glass substrate.