MULTIPLE-BEAM SYSTEM FOR HIGH-SPEED ELECTRON-BEAM INSPECTION
First Claim
1. A multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate, the apparatus comprising:
- an electron source configured to emit electrons;
a condensor electron lens configured to focus the emitted electrons from the electron source into an illumination beam;
a beam splitter lens array configured to split the illumination beam to form a primary beamlet array, wherein the beam splitter lens array comprises a multiple-layer electrostatic lens array stack;
an objective electron lens configured to focus the primary beamlet array onto the surface of the target substrate so as to produce a secondary electron beamlet array;
a scanning system configured to scan the primary beamlet array over an area of the surface of the target substrate; and
a detection system configured to detect individual secondary electron beamlets of the secondary electron beamlet array.
1 Assignment
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Accused Products
Abstract
One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.
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Citations
20 Claims
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1. A multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate, the apparatus comprising:
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an electron source configured to emit electrons; a condensor electron lens configured to focus the emitted electrons from the electron source into an illumination beam; a beam splitter lens array configured to split the illumination beam to form a primary beamlet array, wherein the beam splitter lens array comprises a multiple-layer electrostatic lens array stack; an objective electron lens configured to focus the primary beamlet array onto the surface of the target substrate so as to produce a secondary electron beamlet array; a scanning system configured to scan the primary beamlet array over an area of the surface of the target substrate; and a detection system configured to detect individual secondary electron beamlets of the secondary electron beamlet array. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 10, 11, 12, 13, 14)
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9. (canceled)
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15. A method of imaging a surface of a target substrate using a multiple-beamlet electron beam column, the method comprising:
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emitting electrons into a vacuum chamber; focusing the emitted electrons from the electron source into an illumination beam; splitting the illumination beam using a multiple-layer electrostatic lens array stack to form a primary beamlet array; focusing the primary beamlet array onto the surface of the target substrate using an objective electron-lens so as to produce a secondary electron beamlet array; scanning the primary beamlet array over an area of the surface of the target substrate; and detecting individual secondary electron beamlets of the secondary electron beamlet array. - View Dependent Claims (16, 17, 18, 19)
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20. An automated inspection system for inspecting a surface of a target substrate using a multiple-beamlet electron beam column, the automated inspection system comprising:
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an electron source configured to emit electrons; a condensor electron lens configured to focus the emitted electrons from the electron source into an illumination beam; a beam splitter lens array configured to split the illumination beam to form a primary beamlet array, wherein the beam splitter lens array comprises a multiple-layer electrostatic lens array stack; an objective electron lens configured to focus the primary beamlet array onto the surface of the target substrate so as to produce a secondary electron beamlet array; a scanning system configured to scan the primary beamlet array over an area of the surface of the target substrate; and a detection system configured to detect individual secondary electron beamlets of the secondary electron beamlet array.
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Specification