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MULTIPLE-BEAM SYSTEM FOR HIGH-SPEED ELECTRON-BEAM INSPECTION

  • US 20120241606A1
  • Filed: 04/27/2011
  • Published: 09/27/2012
  • Est. Priority Date: 03/23/2011
  • Status: Active Grant
First Claim
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1. A multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate, the apparatus comprising:

  • an electron source configured to emit electrons;

    a condensor electron lens configured to focus the emitted electrons from the electron source into an illumination beam;

    a beam splitter lens array configured to split the illumination beam to form a primary beamlet array, wherein the beam splitter lens array comprises a multiple-layer electrostatic lens array stack;

    an objective electron lens configured to focus the primary beamlet array onto the surface of the target substrate so as to produce a secondary electron beamlet array;

    a scanning system configured to scan the primary beamlet array over an area of the surface of the target substrate; and

    a detection system configured to detect individual secondary electron beamlets of the secondary electron beamlet array.

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