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METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE

  • US 20120241919A1
  • Filed: 10/18/2010
  • Published: 09/27/2012
  • Est. Priority Date: 12/11/2009
  • Status: Active Grant
First Claim
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1. A method for manufacturing a semiconductor device,the method comprising the steps of:

  • forming a first substrate by forming an island pattern of a plurality of elements disposed on a base substrate;

    bonding the first substrate and a second substrate that is different from the first substrate via some of the plurality of elements; and

    irradiating regions in which said some of the plurality of elements are provided with a laser having a wavelength that causes multiphoton absorption so as to separate said some of the plurality of elements from the first substrate and selectively transfer said some of the plurality of elements onto the second substrate.

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