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SIDEWALL IMAGE TRANSFER PROCESS

  • US 20120244711A1
  • Filed: 03/23/2011
  • Published: 09/27/2012
  • Est. Priority Date: 03/23/2011
  • Status: Active Grant
First Claim
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1. A method comprising:

  • forming a set of sidewall spacers next to a plurality of mandrels, said set of sidewall spacers being directly on top of a hard-mask layer;

    transferring image of at least a portion of said set of sidewall spacers to said hard-mask layer to form a device pattern; and

    transferring said device pattern from said hard-mask layer to a substrate underneath said hard-mask layer.

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