×

E-Beam Enhanced Decoupled Source for Semiconductor Processing

  • US 20120258606A1
  • Filed: 01/24/2012
  • Published: 10/11/2012
  • Est. Priority Date: 04/11/2011
  • Status: Active Grant
First Claim
Patent Images

1. A semiconductor substrate processing system, comprising:

  • a processing chamber;

    a substrate support defined to support a substrate in the processing chamber;

    a plasma chamber defined separate from the processing chamber, the plasma chamber defined to generate a plasma;

    a plurality of fluid transmission pathways fluidly connecting the plasma chamber to the processing chamber, the plurality of fluid transmission pathways defined to supply reactive constituents of the plasma from the plasma chamber to the processing chamber; and

    an electron beam source defined to generate an electron beam and transmit the electron beam through the processing chamber above and across the substrate support.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×