E-Beam Enhanced Decoupled Source for Semiconductor Processing

• US 20120258606A1
• Filed: 01/24/2012
• Published: 10/11/2012
• Est. Priority Date: 04/11/2011
• Status: Active Grant

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Holland, John Patrick, Ventzek, Peter L. G., Singh, Harmeet, Shinagawa, Jun, Koshiishi, Akira
• Granted Patent: US 9,111,728 B2
• Time in Patent Office: Days
• US Class Current: 438/798
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H01J 37/32376 Scanning across large workpieces
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow
• CPC Class Codes: H01J 37/32596 Hollow cathodes

Abstract

A semiconductor substrate processing system includes a processing chamber and a substrate support defined to support a substrate in the processing chamber. The system also includes a plasma chamber defined separate from the processing chamber. The plasma chamber is defined to generate a plasma. The system also includes a plurality of fluid transmission pathways fluidly connecting the plasma chamber to the processing chamber. The plurality of fluid transmission pathways are defined to supply reactive constituents of the plasma from the plasma chamber to the processing chamber. The system further includes an electron injection device for injecting electrons into the processing chamber to control an electron energy distribution within the processing chamber so as to in turn control an ion-to-radical density ratio within the processing chamber. In one embodiment, an electron beam source is defined to transmit an electron beam through the processing chamber above and across the substrate support.

Claims

1. A semiconductor substrate processing system, comprising:

a processing chamber;

a substrate support defined to support a substrate in the processing chamber;

a plasma chamber defined separate from the processing chamber, the plasma chamber defined to generate a plasma;

a plurality of fluid transmission pathways fluidly connecting the plasma chamber to the processing chamber, the plurality of fluid transmission pathways defined to supply reactive constituents of the plasma from the plasma chamber to the processing chamber; and

an electron beam source defined to generate an electron beam and transmit the electron beam through the processing chamber above and across the substrate support.

2. A semiconductor substrate processing system as recited in claim 1, wherein the electron beam source is defined to transmit the electron beam along a trajectory substantially parallel to a surface of the substrate support defined to support the substrate.

3. A semiconductor substrate processing system as recited in claim 1, wherein the electron beam source is defined to transmit multiple spatially separated electron beams through the processing chamber above and across the substrate support in a common direction.

4. A semiconductor substrate processing system as recited in claim 1, wherein the electron beam source is defined to transmit multiple spatially separated electron beams through the processing chamber above and across the substrate support in respective multiple directions.

5. A semiconductor substrate processing system as recited in claim 4, wherein the electron beam source is defined to sequentially transmit the multiple spatially separated electron beams.

6. A semiconductor substrate processing system as recited in claim 1, further comprising:

a plurality of conductive grids positioned outside a perimeter of the substrate support and above the substrate support, the plurality of conductive grids electrically connected to a power supply so as to have a controlled voltage level applied to each of the plurality of conductive grids in a independently controlled manner.

7. A semiconductor substrate processing system as recited in claim 6, wherein the electron beam source is defined as a hollow cathode positioned outside a perimeter of the substrate support and above the substrate support, the hollow cathode having an outlet oriented toward a region of the processing chamber over the substrate support, and wherein a given one of the plurality of conductive grids is disposed between the outlet of the hollow cathode and the region of the processing chamber over the substrate support to facilitate extraction of electrons from the hollow cathode.

8. A semiconductor substrate processing system as recited in claim 7, wherein another one of the plurality of conductive grids is disposed opposite the substrate support from the outlet of the hollow cathode to provide an electrical sink for the electron beam to be transmitted by the hollow cathode.

9. A semiconductor substrate processing system as recited in claim 7, further comprising:

a heater connected to the plurality of conductive grids to control a temperature of the plurality of conductive grids.

10. A semiconductor substrate processing system as recited in claim 7, further comprising:

a gas supply in fluid communication with an interior region of the hollow cathode, the gas supply defined to supply a process gas to the interior region of the hollow cathode; and

a power supply in electrical communication with one or more power delivery components within the interior region of the hollow cathode, the power supply defined to supply direct current power, radiofrequency power, or a combination of direct current power and radiofrequency power to the one or more power delivery components within the interior region of the hollow cathode to provide for transformation of the process gas into a plasma within the interior region of the hollow cathode.

11. A method for processing a semiconductor substrate, comprising:

placing a substrate on a substrate support in exposure to a processing region;

generating a plasma in a plasma generation region separate from the processing region;

supplying reactive constituents of the plasma from the plasma generation region to the processing region; and

injecting electrons into the processing region over the substrate, whereby the injected electrons modify an ion density in the processing region to affect processing of the substrate.

12. A method for processing a semiconductor substrate as recited in claim 11, wherein injecting electrons into the processing region includes transmitting an electron beam along a trajectory substantially parallel to a top surface of the substrate.

13. A method for processing a semiconductor substrate as recited in claim 12, wherein the trajectory of the electron beam extends in a linear manner from a first location outside a periphery of the substrate support and above the substrate support to a second location outside the periphery of the substrate support and above the substrate support.

14. A method for processing a semiconductor substrate as recited in claim 13, further comprising:

applying a positive electrical charge to a conductive grid at the second location such that the conductive grid functions as an electrical sink for the electron beam transmitted along the trajectory.

15. A method for processing a semiconductor substrate as recited in claim 11, wherein the electrons are injected into the processing region in a pulsed manner.

16. A method for processing a semiconductor substrate as recited in claim 11, wherein injecting electrons into the processing region includes transmitting multiple spatially separated electron beams through the processing chamber above and across a top surface of the substrate.

17. A method for processing a semiconductor substrate as recited in claim 16, wherein each of the multiple spatially separated electron beams is transmitted in a common direction such that the multiple spatially separated electron beams are transmitted in a substantially parallel manner above and across the top surface of the substrate.

18. A method for processing a semiconductor substrate as recited in claim 16, wherein different ones of the multiple spatially separated electron beams are transmitted at different times such that electrons are injected in a time-averaged substantially uniform manner throughout the processing region in exposure to the substrate.

19. A method for processing a semiconductor substrate as recited in claim 16, wherein the multiple spatially separated electron beams are transmitted in different multiple directions above and across the top surface of the substrate and substantially parallel to the top surface of the substrate.

20. A method for processing a semiconductor substrate as recited in claim 11, wherein different ones of the multiple spatially separated electron beams are transmitted at different times such that electrons are injected in a time-averaged substantially uniform manner throughout the processing region in exposure to the substrate.