×

METHOD OF DEPOSITING SILICON ON CARBON NANOMATERIALS

  • US 20120264020A1
  • Filed: 10/07/2011
  • Published: 10/18/2012
  • Est. Priority Date: 10/07/2010
  • Status: Abandoned Application
First Claim
Patent Images

1. A method of depositing silicon on the interior and exterior surfaces of a carbon nanomaterial comprising:

  • providing a carbon nanomaterial selected from vapor grown carbon nanofibers, a carbon nanomat, and a powder comprising carbon nanofibers;

    flowing a silicon-containing precursor gas in contact with said carbon nanomaterial for a time sufficient for said gas to decompose and form a silicon coating on said surfaces of said carbon nanomaterial.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×