THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR FABRICATING THE THIN FILM TRANSISTOR ARRAY SUBSTRATE
First Claim
1. A method for fabricating a thin film transistor (TFT) array substrate, comprising the steps of:
- (1) depositing a transparent conductive film layer and a source-drain metal layer in this order on a base substrate, and forming source electrodes, drain electrodes, data scan lines and transparent pixel electrodes by a first pattering process, with the transparent conductive film layer being left under the source electrodes, the drain electrodes and the data scan lines;
(2) on the substrate obtained from the step (1), depositing a semiconductor layer and forming a patterned semiconductor layer by a second pattering process; and
(3) on the substrate obtained from the step (2), depositing a gate insulator and a gate metal film in this order, and forming gate electrodes and gate scan lines by a third pattering process, the gate electrodes being located over the patterned semiconductor layer.
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Abstract
The present disclosed technology is related to a TFT array substrate and a method for fabricating the TFT array substrate. The method may comprise: depositing a transparent conductive film layer and a source-drain metal layer in this order on a base substrate, and forming source electrodes, drain electrodes, data scan lines and transparent pixel electrodes by a first pattering process, with the transparent conductive film layer being left under the source electrodes, the drain electrodes and the data scan lines; on the resultant substrate, depositing a semiconductor layer and forming a patterned semiconductor layer by a second pattering process; and on the resultant substrate, depositing a gate insulator and a gate metal film in this order, and forming gate electrodes and gate scan lines by a third pattering process, the gate electrodes being located over the patterned semiconductor layer.
19 Citations
16 Claims
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1. A method for fabricating a thin film transistor (TFT) array substrate, comprising the steps of:
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(1) depositing a transparent conductive film layer and a source-drain metal layer in this order on a base substrate, and forming source electrodes, drain electrodes, data scan lines and transparent pixel electrodes by a first pattering process, with the transparent conductive film layer being left under the source electrodes, the drain electrodes and the data scan lines; (2) on the substrate obtained from the step (1), depositing a semiconductor layer and forming a patterned semiconductor layer by a second pattering process; and (3) on the substrate obtained from the step (2), depositing a gate insulator and a gate metal film in this order, and forming gate electrodes and gate scan lines by a third pattering process, the gate electrodes being located over the patterned semiconductor layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A thin film transistor (TFT) array substrate comprising:
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a base substrate; transparent pixel electrodes provided above the base substrate; source electrodes, drain electrodes and data scan lines with the transparent conductive film for forming the transparent pixel electrodes being left under them; a patterned semiconductor layer formed on the source electrodes and the drain electrodes; a gate insulator covering the patterned semiconductor layer; and gate electrodes and gate scan lines formed on the gate insulator and located over the patterned semiconductor layer. - View Dependent Claims (14, 15, 16)
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Specification