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GAS DISTRIBUTION SYSTEM FOR CERAMIC SHOWERHEAD OF PLASMA ETCH REACTOR

  • US 20120305190A1
  • Filed: 05/31/2011
  • Published: 12/06/2012
  • Est. Priority Date: 05/31/2011
  • Status: Active Grant
First Claim
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1. A gas delivery system useful for supplying process gas to a ceramic showerhead for an inductively coupled plasma processing apparatus wherein semiconductor substrates supported on a substrate support are subjected to plasma etching, the ceramic showerhead including radially extending gas inlets extending inwardly from an outer periphery thereof, the gas delivery system comprising:

  • gas connection blocks adapted to attach to the ceramic showerhead such that a gas outlet of each of the blocks is in fluid communication with a respective one of the gas inlets in the ceramic showerhead;

    a gas ring having equal length channels of uniform cross section therein and gas outlets in fluid communication with downstream ends of the channels, each of the gas outlets being located on a mounting surface engaging a respective one of the gas connection blocks, each of the gas outlets in fluid communication with a gas inlet in a respective one of the gas connection blocks.

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