GAS DISTRIBUTION SYSTEM FOR CERAMIC SHOWERHEAD OF PLASMA ETCH REACTOR
First Claim
1. A gas delivery system useful for supplying process gas to a ceramic showerhead for an inductively coupled plasma processing apparatus wherein semiconductor substrates supported on a substrate support are subjected to plasma etching, the ceramic showerhead including radially extending gas inlets extending inwardly from an outer periphery thereof, the gas delivery system comprising:
- gas connection blocks adapted to attach to the ceramic showerhead such that a gas outlet of each of the blocks is in fluid communication with a respective one of the gas inlets in the ceramic showerhead;
a gas ring having equal length channels of uniform cross section therein and gas outlets in fluid communication with downstream ends of the channels, each of the gas outlets being located on a mounting surface engaging a respective one of the gas connection blocks, each of the gas outlets in fluid communication with a gas inlet in a respective one of the gas connection blocks.
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Accused Products
Abstract
A gas delivery system for a ceramic showerhead includes gas connection blocks and a gas ring, the gas connection blocks mounted on the gas ring such that gas outlets in the blocks deliver process gas to gas inlets in an outer periphery of the showerhead. The gas ring includes a bottom ring with channels therein and a welded cover plate enclosing the channels. The gas ring can include a first channel extending ½ the length of the gas ring, two second channels connected at midpoints thereof to downstream ends of the first channel, and four third channels connected at midpoints thereof to downstream ends of the second channels. the cover plate can include a first section enclosing the first channel, two second sections connected at midpoints thereof to ends of the first section, and third sections connected at midpoints thereof to ends of the second sections. The channels are arranged such that the process gas travels equal distances for a single gas inlet in the gas ring to eight outlets in the cover ring allowing equal gas flow.
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Citations
17 Claims
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1. A gas delivery system useful for supplying process gas to a ceramic showerhead for an inductively coupled plasma processing apparatus wherein semiconductor substrates supported on a substrate support are subjected to plasma etching, the ceramic showerhead including radially extending gas inlets extending inwardly from an outer periphery thereof, the gas delivery system comprising:
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gas connection blocks adapted to attach to the ceramic showerhead such that a gas outlet of each of the blocks is in fluid communication with a respective one of the gas inlets in the ceramic showerhead; a gas ring having equal length channels of uniform cross section therein and gas outlets in fluid communication with downstream ends of the channels, each of the gas outlets being located on a mounting surface engaging a respective one of the gas connection blocks, each of the gas outlets in fluid communication with a gas inlet in a respective one of the gas connection blocks. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification