DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME

• US 20120307173A1
• Filed: 02/16/2011
• Published: 12/06/2012
• Est. Priority Date: 04/19/2010
• Status: Abandoned Application

• Current Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Original Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Inventors: Fujita, Tetsuo, Hara, Yoshihito, Nakata, Yukinobu
• Application Number:
  US13/578,371
• Publication Number:
  US 20120307173A1
• Time in Patent Office: Days
• US Class Current: 349/43
• CPC Class Codes: G02F 1/136227 Through-hole connection of the pixel electrode to the active element through an insulation layer
• CPC Class Codes: G02F 1/136286 Wiring, e.g. gate line, drain line
• CPC Class Codes: H01L 27/1288 employing particular masking sequences or specially adapted masks, e.g. half-tone mask

Abstract

A method for fabricating a display device includes the steps of forming a multilayer structure in which a first conducting film and a second conducting film are stacked in this order, removing part of the second conducting film and forming a contact region in which the first conducting film does not overlap with the second conducting film, thereby forming the electrode portion from the multilayer structure, forming a planarized film made of a photosensitive material on the substrate on which the electrode portion is formed to cover the electrode portion, thereby forming a contact hole located inside the contact region and passing through the planarized film, and forming a pixel electrode on a surface of the planarized film to cover part of the first conducting film located inside the contact hole and exposed from the planarized film.

Claims

1. A method for fabricating a display device including a first substrate having a plurality of switching elements, and a plurality of electrode portions each of which is electrically connected to a corresponding one of the switching elements, and a second substrate provided to face the first substrate, each of the electrode portions having a first conducting film, and a second conducting film stacked on the first conducting film and is made of a low resistance metal film whose electrical resistance is lower than that of the first conducting film, the method comprising the steps of:

forming a multilayer structure in which the first conducting film and the second conducting film are stacked in this order on a substrate constituting the first substrate;

removing part of the second conducting film and forming a contact region in which the first conducting film does not overlap with the second conducting film, thereby forming each of the electrode portions from the multilayer structure;

forming a planarized film made of a photosensitive material on the substrate on which each of the electrode portions is formed to cover the electrode portions, thereby forming a contact hole located inside the contact region and passing through the planarized film; and

forming a pixel electrode on a surface of the planarized film to cover part of the first conducting film located inside the contact hole and exposed from the planarized film.

2. The method of claim 1, further comprising the step of

forming a protective film covering the multilayer structure, and forming an opening in the protective film so that part of the second conducting film of the multilayer structure is exposed from the protective film,

wherein

in the step of forming the electrode portions, the part of the second conducting film exposed in the opening of the protective film is removed to form the contact region.

3. The method of claim 2, wherein

in the step of forming the opening in the protective film, a mask pattern made of a resist is formed on a surface of the protective film, thereby etching part of the protective film exposed from the mask pattern.

4. The method of claim 1, wherein

after a protective film covering the electrode portions is formed, a step of forming the planarized film on the protective film to form the contact hole is performed.

5. The method of claim 1, wherein

the low resistance metal film constituting the second conducting film is an aluminum film or an aluminum alloy film including aluminum as a main component.

6. The method of claim 1, wherein

the first conducting film is a titanium film.

7. The method of claim 1, wherein

the display device is a liquid crystal display device in which a liquid crystal display layer is provided between the first substrate and the second substrate.

8. A display device, comprising:

a first substrate having a plurality of switching elements, and a plurality of electrode portions having a plurality of electrode portions each of which is electrically connected to a corresponding one of the switching elements; and

a second substrate provided to face the first substrate, each of the electrode portions having a first conducting film, and a second conducting film stacked on the first conducting film and made of a low resistance metal film whose electrical resistance is lower than that of the first conducting film,

wherein

each of the electrode portions has a contact region in which the first conducting film does not overlap with the second conducting film,

a planarized film made of a photosensitive material and covering each of the electrode portions is formed on the first substrate,

a contact hole passing through the planarized film is formed in an inside of the contact region,

a pixel electrode is formed on a surface of the planarized film to cover part of the first conducting film located inside the contact hole and exposed from the planarized film, and

an inner circumferential surface of the contact hole is formed to be smooth without steps.

9. The display device of claim 8, further comprising

a protective film directly covering the electrode portions,

wherein

the protective film has an opening formed in a region in which the contact region is formed, and

the contact hole is formed inside the contact region and the opening of the protective film.

10. The display device of claim 8, further comprising

a protective film directly covering the electrode portions,

wherein

the protective film has an opening inside the contact region, and

the opening constitutes part of the inner circumferential surface of the contact hole.

11. The display device of claim 8, wherein

the low resistance metal film constituting the second conducting film is an aluminum film or an aluminum alloy film including aluminum as a main component.

12. The display device of claim 8, wherein

the first conducting film is a titanium film.

13. The display device of claim 8, wherein

the display device is a liquid crystal display device in which a liquid crystal display layer is provided between the first substrate and the second substrate.