APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
First Claim
1. A showerhead assembly for a vapor deposition process, comprising:
- a showerhead plate having a top surface, a bottom surface, and a radius extending from the center to the outer edge of the showerhead plate;
a first plurality of holes extending through the showerhead plate and in fluid communication with the top surface and the bottom surface, positioned within a first zone extending from the center of the showerhead plate to about 25% of the radius of the showerhead plate, and each hole of the first plurality comprises a diameter of less than 0.1 inches; and
a second plurality of holes extending through the showerhead plate and in fluid communication with the top surface and the bottom surface, positioned within a second zone extending from about 25% of the radius of the showerhead plate to about the outer edge of the showerhead plate, and each hole of the second plurality comprises a diameter of greater than 0.1 inches.
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Accused Products
Abstract
Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate support therein. In one embodiment, the chamber lid assembly has an inlet manifold assembly containing an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further contains injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel. The chamber lid assembly further contains a showerhead assembly disposed below the inlet manifold assembly, a water box disposed between the inlet manifold assembly and the showerhead assembly, and a remote plasma system (RPS) disposed above and coupled with the inlet manifold assembly, and in fluid communication with the centralized channel.
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Citations
15 Claims
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1. A showerhead assembly for a vapor deposition process, comprising:
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a showerhead plate having a top surface, a bottom surface, and a radius extending from the center to the outer edge of the showerhead plate; a first plurality of holes extending through the showerhead plate and in fluid communication with the top surface and the bottom surface, positioned within a first zone extending from the center of the showerhead plate to about 25% of the radius of the showerhead plate, and each hole of the first plurality comprises a diameter of less than 0.1 inches; and a second plurality of holes extending through the showerhead plate and in fluid communication with the top surface and the bottom surface, positioned within a second zone extending from about 25% of the radius of the showerhead plate to about the outer edge of the showerhead plate, and each hole of the second plurality comprises a diameter of greater than 0.1 inches. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A showerhead assembly for a vapor deposition process, comprising:
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a showerhead plate comprising an aluminum alloy and having a top surface, a bottom surface, and a radius extending from the center to the outer edge of the showerhead plate; a first plurality of holes extending through the showerhead plate and in fluid communication with the top surface and the bottom surface, and disposed within a first zone which extends from the center of the showerhead plate to a second zone circumscribing the first zone, and each hole of the first plurality comprises a diameter of less than 0.1 inches; and a second plurality of holes extending through the showerhead plate and in fluid communication with the top surface and the bottom surface, and disposed within the second zone which extends from the first zone to about the outer edge of the showerhead plate, and each hole of the second plurality comprises a diameter of greater than 0.1 inches. - View Dependent Claims (11, 12, 13, 14, 15)
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Specification