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SUBSTRATE PROCESSING APPARATUS

  • US 20130014895A1
  • Filed: 07/06/2012
  • Published: 01/17/2013
  • Est. Priority Date: 07/08/2011
  • Status: Active Grant
First Claim
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1. A substrate processing apparatus for performing a process on a substrate disposed within a processing chamber by supplying a gas to the substrate, the apparatus comprising:

  • a gas introducing unit configured to supply one kind of gas or different kinds of gases to a center region and an edge region of the substrate,wherein the gas introducing unit comprises;

    a center gas inlet section having a multiple number of gas holes for a center gas to be supplied toward the center region of the substrate;

    an edge gas inlet section having a multiple number of gas holes for an edge gas to be supplied toward the edge region of the substrate and surrounding the center gas inlet section; and

    an edge gas discharging position adjusting unit configured to adjust a horizontal position or a vertical position of edge gas discharging openings from which the edge gas is discharged through the gas holes of the edge gas inlet section.

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