Method for Forming Gas Sensing Layers

• US 20130017341A1
• Filed: 07/06/2012
• Published: 01/17/2013
• Est. Priority Date: 07/15/2011
• Status: Abandoned Application

• Current Assignee: Centre de Recherche Public Gabriel Lippmann
• Original Assignee: Centre de Recherche Public Gabriel Lippmann
• Inventors: Choquet, Patrick, Boscher, Nicolas, Duday, David
• Application Number:
  US13/542,754
• Publication Number:
  US 20130017341A1
• Time in Patent Office: Days
• US Class Current: 427/489
• CPC Class Codes: G01N 21/783 for analysing gases

Abstract

The present disclosure provides a method for forming a porous colorimetric gas sensing layer. In various embodiments, the method comprises providing a mixture of an organic solvent, a polymer forming material and a gas sensing compound or gas sensing particles. The method additionally comprises depositing the mixture (sprayed or vaporized) on at least a surface portion of a substrate. Thereafter, an atmospheric pressure plasma is applied to the surface portion to form a polymer layer comprising the gas sensing compound or particles. The steps of depositing the mixture and applying the plasma can be repeated multiple times to form a plurality of stacked or superposed polymer layers comprising the gas sensing compound or particles.

Claims

1. Method for forming a porous colorimetric gas sensing layer, said method comprising:

providing a mixture of an organic solvent, a polymer forming material and one of a gas sensing compound or gas sensing particles;

depositing the mixture on at least a surface portion of a substrate; and

applying an atmospheric pressure plasma to the surface portion to form a polymer layer comprising the one of the gas sensing compound and the gas sensing particles.

2. The method according to claim 1, further comprising repeating the steps of depositing the mixture on at least a surface portion of a substrate, and applying an atmospheric pressure plasma to the surface portion, multiple times to form a plurality of stacked polymer layers comprising the one of the gas sensing compound and the gas sensing particles.

3. The method according to claim 1, wherein the one of the gas sensing compound and the gas sensing particles comprise an indicator dye and one or more of pyrrole-based macrocycles, tetrapyrrols, porphyrins, metalloporphyrins, phthalocyanines, calixarenes, crystalline coordination polymers and compounds thereof.

4. The method according to claim 2, wherein the polymer forming material is based on organosilicon compounds.

5. The method according to claim 4, wherein the polymer forming material comprises one of hexamethyldisiloxane, octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, hexaethyldisiloxane, tetraethylorthosilicate, aminopropyltrimethoxysilane, tetramethyldisiloxane, pentamethylcyclopentasiloxane, octamethylcyclooctasiloxane, polydimethylsiloxane and its derivatives.

6. The method according to claim 5, wherein the organic solvent is chosen from non-polar solvents, polar aprotic solvents, or polar protic solvents.

7. The method according to claim 6, wherein the organic solvent comprises one or more of ethanol, methanol, isopropanol, chloroform, dichloromethane, tetrahydrofuran, and aceton solvents.

8. The method according to claim 7, wherein applying the atmospheric pressure plasma is carried out between a temperature of 5°

C. and 90°

C.

9. The method according to claim 8, wherein the substrate comprises one of glass, plastic, composite materials and metals.

10. The method according to claim 9, wherein an oxygen content in the plasma process gas is lower than 500 ppm.

11. The method according to claim 10, wherein vapors of one or more polymer forming materials are added to the plasma process gas.

12. The method according to claim 12, wherein depositing the mixture is controlled by means of an atomizing nozzle.

13. The method according to claim 12, wherein steps of providing a mixture of an organic solvent, a polymer forming material and one of a gas sensing compound or gas sensing particles, and depositing the mixture on at least a surface portion of a substrate, are repeated ten or more times.

14. The method according to claim 13, wherein the substrate is provided on a moving stage transporting the substrate through a mixture deposition zone to deposit the mixture on at least a portion of the substrate and a plasma zone in which the atmospheric pressure plasma is applied.

15. The method according to claim 14, wherein the moving stage is adapted to move the substrate repeatedly through the zones.

16. The method according to claim 15, wherein the substrate is exposed to a plasma afterglow region before entering the direct plasma application.