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SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING PROCESSING SOLUTION

  • US 20130020284A1
  • Filed: 07/02/2012
  • Published: 01/24/2013
  • Est. Priority Date: 07/20/2011
  • Status: Active Grant
First Claim
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1. A substrate processing apparatus that supplies a processing solution to a substrate, comprising:

  • a substrate holding element for holding a substrate in a substantially horizontal position thereon while causing the substrate to rotate;

    a cup surrounding said substrate holding element;

    a nozzle arm with a discharge head provided at its tip end, the discharge head discharging a processing solution to a substrate held on said substrate holding element;

    a pivotal driving part for causing said nozzle arm to pivot such that said discharge head moves between a processing position above a substrate held on said substrate holding element and a standby position outside said cup; and

    an arm cleaning element for cleaning at least part of said nozzle arm that is to face a substrate held on said substrate holding element when said discharge head has moved to said processing position.

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