Optical Proximity Correction Method
First Claim
Patent Images
1. An optical proximity correction method, comprising:
- providing a target pattern;
decomposing the target pattern into a first pattern and a second pattern, wherein the first pattern and the second pattern are alternately arranged in a dense region;
providing a first compensation pattern into the second pattern to become a second revised pattern and providing a second compensation pattern into the first pattern to become a first revised pattern;
outputting the first revised pattern onto a first mask; and
outputting the second revised pattern onto a second mask.
1 Assignment
0 Petitions
Accused Products
Abstract
An optical proximity correction method is provided. A target pattern is provided, and then the target pattern is decomposed to a first pattern and a second pattern. The first pattern and the second pattern are alternately arranged in a dense region. Then, a compensation pattern is provided and it is determined whether the compensation pattern is added into the first pattern to become a first revised pattern, or into the second pattern to become a second revised pattern. Finally, the first revised pattern is output onto a first mask and the second revised pattern is output onto a second mask.
-
Citations
20 Claims
-
1. An optical proximity correction method, comprising:
-
providing a target pattern; decomposing the target pattern into a first pattern and a second pattern, wherein the first pattern and the second pattern are alternately arranged in a dense region; providing a first compensation pattern into the second pattern to become a second revised pattern and providing a second compensation pattern into the first pattern to become a first revised pattern; outputting the first revised pattern onto a first mask; and outputting the second revised pattern onto a second mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
-
-
19. A circuit pattern, comprising a plurality of stripe patterns parallel to each other along a first direction, the stripe patterns are disposed in a dense region and comprise:
-
a first edge stripe pattern adjacent to the edge of the dense region; and a second edge stripe pattern adjacent to the first edge stripe pattern, wherein the first edge stripe pattern comprises a compensation pattern which extrudes from the first edge stripe pattern in a side opposite to the second edge stripe pattern. - View Dependent Claims (20)
-
Specification