FOCUS DETECTION APPARATUS FOR PROJECTION LITHOGRAPHY SYSTEM

• US 20130027679A1
• Filed: 05/04/2012
• Published: 01/31/2013
• Est. Priority Date: 07/29/2011
• Status: Active Grant

• Current Assignee: The Institute of Optics And Electronics The chinese Academy of Sciences
• Original Assignee: The Institute of Optics And Electronics The chinese Academy of Sciences
• Inventors: LI, Jinlong, HU, Song, ZHAO, Lixin, XU, Feng, LI, Lanlan, SHENG, Zhuang
• Granted Patent: US 8,760,626 B2
• Time in Patent Office: Days
• US Class Current: 355/60
• CPC Class Codes: G03F 9/7026 Focusing
• CPC Class Codes: G03F 9/7061 Scanning probe microscopy, e.g. AFM, scanning tunneling microscopy

Abstract

Disclosed is a focus detection apparatus for a projection lithography system. The apparatus comprises: a laser; a focus optical unit configured to focusing the emitted laser beam; a force detection unit configured to reflect the focused laser beam at the backside; a position detection unit configured to detect variations in position of a light spot formed by the reflected laser beam, and output a strength signal indicating the strength of the interaction force between the force detection unit and the object; a differential amplifier configured to output a Z-direction differential signal based on the strength signal and a reference signal; a Z-direction feedback control unit configured to perform feedback control; and a scan signal generator configured to output a signal for controlling the movement of the stage in the XY plane. The focus detection apparatus has high precision, efficiency and process applicability.

Claims

1. A focus detection apparatus for a projection lithography machine, comprising:

a laser configured to emit a laser beam;

a focus optical unit configured to focus the emitted laser beam;

a force detection unit configured to receive the focused laser beam at the backside of the force detection unit and reflect the received laser beam;

a position detection unit configured to detect variations in position of a light spot formed by the reflected laser beam so as to obtain information about the topography of the object, and to detect and output a strength signal indicating the strength of an interaction force between the force detection unit and an object under detection disposed on a wafer, the wafer being carried on a stage of the projection lithography machine;

a differential amplifier configured to have one of its two input connected to the output of the position detection unit to receive the strength signal, and the other input connected to receive a reference signal, and to perform differential calculation between the strength signal and the reference signal to obtain and output a Z-direction differential signal;

a Z-direction feedback control unit configured to perform feedback control such that a spacing between the force detection unit and the object is maintained within a specified range, wherein the Z-direction feedback control unit has one of its two inputs connected to the output of the differential amplifier to receive the Z-direction differential signal, and the other input connected to receive a predetermined gain signal, and the Z-direction feedback control unit outputs a Z scan drive signal for controlling the movement of the stage in the Z direction; and

a scan signal generator configured to connect to the stage and output to the stage a XY 2D scan drive signal for controlling the movement of the stage in the XY plane, the Z direction being perpendicular to the XY plane.

2. The focus detection apparatus of claim 1, wherein while the stage is driven to move in the XY plane and the object is moved along with the movement of the stage, the interaction force causes the force detection unit to be deflected in accordance with the topography of the object, and the laser beam reflected by the force detection unit is deflected by the deflection,

the position detection unit detects a change in position of the light spot caused by the laser beam deflection to obtain the information about the topography of the object.

3. The focus detection apparatus of claim 1, wherein the Z-direction feedback control unit is further configured to change the Z scan drive signal based on the received Z-direction differential signal so as to control the movement of the stage and the object in the Z direction, such that the spacing between the force detection unit and the object is maintained within the specified range.

4. The focus detection apparatus of claim 1, wherein the specified range is a range of 1˜

100 nanometers,

the force detection unit is configured to have a probe, and the interaction force comprises inter-atomic force between atoms of the tip of the probe and atoms of the object.

5. The focus detection apparatus of claim 1, wherein the object under detection comprises a photoresist disposed on the wafer, and the wafer is vacuum-absorbed onto the stage.

6. The focus detection apparatus of claim 1, wherein the stage is configured to include a Z-direction leveling and focusing mechanism which moves the stage and the object in the Z direction under the control of the Z scan drive signal.

7. The focus detection apparatus of claim 1, further comprising:

a 3D topography data storage unit configured to connect to the scan signal generator and the Z-direction feedback control unit to receive (x, y) coordinate data from the scan signal generator and z coordinate data from the Z-direction feedback control unit, and store the received data as 3D topography data (x, y, z) for the object.

8. The focus detection apparatus of claim 1, wherein the force detection unit comprises a micro suspension arm made from a silicon or silicon nitride wafer having a length of 100-500 μ

m and a thickness of 500 nm-5 μ

m.

9. The focus detection apparatus of claim 8, wherein the micro suspension arm has a probe at its end part,

the probe is configured to have a sharp tip for detecting the inter-atomic force between atoms of the tip of the probe and atoms of the object.

10. The focus detection apparatus of claim 1, wherein the position detection unit comprises a position-sensitive photoelectric detector,

the position-sensitive photoelectric detector comprises a quadrant detector or a CCD image sensor.

11. The focus detection apparatus of claim 6, wherein the Z-direction leveling and focusing mechanism comprises three piezoelectric ceramics arranged in an equilateral shape.

12. The focus detection apparatus of claim 1, wherein the stage comprises a six-freedom stage which is driven by a coarse/fine movement driving unit consisting of a linear motor and a Lorenz motor.