WAVEFRONT ABERRATION MEASURING APPARATUS

• US 20130027691A1
• Filed: 10/05/2012
• Published: 01/31/2013
• Est. Priority Date: 04/05/2010
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Otaki, Tatsuro
• Granted Patent: US 8,558,996 B2
• Time in Patent Office: Days
• US Class Current: 356/124
• CPC Class Codes: G01M 11/02 Testing optical properties
• CPC Class Codes: G01M 11/0257 by analyzing the image formed by the object to be tested
• CPC Class Codes: Y10T 29/49771 Quantitative measuring or gauging

Abstract

A wavefront aberration measuring apparatus comprising: an illumination optical system provided to an incident side of a test lens; and a measuring optical system provided to an exit side of the test lens, the illumination optical system including an aperture stop capable of being opened and closed, and the illumination optical system being movable along an optical axis of the illumination optical system so as to adjust positions of the aperture stop and an entrance pupil of the test lens to have an optically conjugate relation with each other. Accordingly, it becomes possible to provide a wavefront aberration measuring apparatus capable of suppressing errors in measured result.

Claims

1. A wavefront aberration measuring apparatus comprising:

an illumination optical system provided to an incident side of a test lens; and

a measuring optical system provided to an exit side of the test lens,

the illumination optical system including an aperture stop capable of being opened and closed, and

the illumination optical system being movable along an optical axis of the illumination optical system so as to adjust positions of the aperture stop and an entrance pupil of the test lens to have an optically conjugate relation with each other.

2. The wavefront aberration measuring apparatus according to claim 1, wherein the illumination optical system includes a projection lens, and the projection lens and the other components in the illumination optical system are relatively movable with each other along the optical axis of the illumination optical system.

3. The wavefront aberration measuring apparatus according to claim 1, wherein the measuring optical system is movable along an optical axis of the test lens.

4. The wavefront aberration measuring apparatus according to claim 1, wherein the measuring optical system includes a wavefront sensor that is movable along the optical axis of the test lens.

5. The wavefront aberration measuring apparatus according to claim 1, further comprising:

an imaging device being disposed on an optically conjugate position with respect to the aperture stop and the entrance pupil of the test lens.

6. The wavefront aberration measuring apparatus according to claim 5, further comprising:

a lens array being disposed on an optically conjugate position with respect to the aperture stop and an entrance pupil of the test lens.

11. The wavefront aberration measuring apparatus according to claim 1, wherein the measuring optical system is disposed linearly with respect to the illumination optical system.

12. The wavefront aberration measuring apparatus according to claim 1, wherein the measuring optical system is disposed with inclining with respect to the illumination optical system.

13. A method for manufacturing a lens system having a plurality of lens components, the method comprising steps of:

assembling the lens system with disposing the plurality of lens components into a lens barrel;

measuring wavefront aberration of the assembled lens system by means of the wavefront aberration measuring apparatus according to claim 1; and

judging whether the lens system is good or not from the measured result.

7. A wavefront aberration measuring apparatus comprising:

an illumination optical system provided to an incident side of a test lens; and

a measuring optical system provided to an exit side of the test lens,

the illumination optical system including an aperture stop capable of being opened and closed, and

the measuring optical system and the test lens being movable along an optical axis of the test lens so as to adjust positions of the aperture stop and an entrance pupil of the test lens to have an optically conjugate relation with each other.

8. The wavefront aberration measuring apparatus according to claim 7, wherein the measuring optical system includes a wavefront sensor that is movable along the optical axis of the test lens.

9. A wavefront aberration measuring apparatus comprising:

an illumination optical system provided to an incident side of a test lens; and

a measuring optical system provided to an exit side of the test lens,

the illumination optical system including an aperture stop capable of being opened and closed, and

the measuring optical system including a wavefront sensor that is movable along an optical axis of the test lens such that the aperture stop and an entrance pupil of the test lens are adjusted to positions to have optically conjugate relation with each other.

10. The wavefront aberration measuring apparatus according to claim 9, wherein the measuring optical system is movable along the optical axis of the test lens.