DISPLAY DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE

• US 20130032832A1
• Filed: 07/31/2012
• Published: 02/07/2013
• Est. Priority Date: 08/03/2011
• Status: Active Grant

• Current Assignee: Japan Display Incorporated
• Original Assignee: Japan Display East Incorporated (Japan Display Incorporated)
• Inventors: KARIKOME, Osamu, ISHII, Miyo, YAMASHITA, Manabu
• Granted Patent: US 9,099,359 B2
• Time in Patent Office: Days
• US Class Current: 257/88
• CPC Class Codes: H01L 27/1244 for preventing breakage, peeling or short circuiting
• CPC Class Codes: H01L 27/1248 with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
• CPC Class Codes: H01L 27/1288 employing particular masking sequences or specially adapted masks, e.g. half-tone mask

Abstract

A display device includes an electrode layer formed at a predetermined position on a substrate, an insulating film having a through-hole formed on the top of the electrode layer, and a wiring film connected to the electrode layer via the through-hole formed in the insulating film. Based on a surface of the substrate, the through-hole includes a first taper portion having a first taper angle, a second taper portion formed higher than the first taper portion and having a second taper angle different from the first taper angle, and a third taper portion formed higher than the second taper portion and having a third taper angle different from the second taper angle.

Claims

1. A display device comprising:

an electrode layer formed at a predetermined position on a substrate;

an insulating film having a through-hole formed on the top of the electrode layer; and

a wiring film connected to the electrode layer via the through-hole formed in the insulating film,

wherein based on a surface of the substrate, the through-hole includes;

a first taper portion having a first taper angle, a second taper portion formed higher than the first taper portion and having a second taper angle different from the first taper angle, and

a third taper portion formed higher than the second taper portion and having a third taper angle different from the second taper angle.

2. The display device according to claim 1, wherein the first taper angle is greater than the second taper angle.

3. The display device according to claim 1, wherein the third taper angle is greater than the second taper angle.

4. The display device according to claim 1, wherein the second taper angle is 10°

or less.

5. The display device according to claim 1, wherein the diameter of the through-hole at a portion contacting the electrode layer is 7.6 μ

m or less.

6. The display device according to claim 1, wherein the through-hole is arranged in a frame area positioned at the periphery of a display area of the display device.

7. A method for manufacturing a display device including a thin film transistor and a through-hole, comprising:

forming an electrode layer having a predetermined shape on a substrate;

forming an insulating film on the substrate and on the electrode layer;

forming a semiconductor layer on the insulating film;

forming a resist having at least two different thicknesses on the semiconductor layer;

removing by etching a portion of the semiconductor layer, the portion being in an area for forming a through-hole;

removing the resist formed in an area other than an area for forming the thin film transistor;

etching the semiconductor layer to remove the semiconductor layer in the area other than the area for forming the thin film transistor and to form the through-hole; and

forming a wiring layer and source and drain electrodes on the top of the gate through-hole and on the semiconductor layer in the area for forming the thin film transistor.

8. The method for manufacturing the display device according to claim 7, wherein an exposure mask used in the forming of the resist that has the at least two different thicknesses is a half exposure mask including a half transmission area that blocks approximately one-half of light.