INTEGRATED CIRCUIT DEVICE HAVING DEFINED GATE SPACING AND METHOD OF DESIGNING AND FABRICATING THEREOF
First Claim
1. A method of integrated circuit fabrication, comprising:
- forming a first gate structure having a width (W) and a length (L);
forming a second gate structure separated a distance from a first side of the first gate structure, wherein the distance of separation greater than;
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Abstract
A device, and method of fabricating and/or designing such a device, including a first gate structure having a width (W) and a length (L) and a second gate structure separated from the first gate structure by a distance greater than: (√{square root over (W*W+L*L)})/10. The second gate structure is a next adjacent gate structure to the first gate structure. A method and apparatus for designing an integrated circuit including implementing a design rule defining the separation of gate structures is also described. In embodiments, the distance of separation is implemented for gate structures that are larger relative to other gate structures on the substrate (e.g., greater than 3 μm2).
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Citations
19 Claims
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1. A method of integrated circuit fabrication, comprising:
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forming a first gate structure having a width (W) and a length (L); forming a second gate structure separated a distance from a first side of the first gate structure, wherein the distance of separation greater than; - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. An apparatus comprising a computer-readable medium encoded with a computer program that, when executed:
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receives a first pattern including a first gate structure and a second gate structure having a width (W) and a length (L); performs a design rule check on the first pattern, wherein the design rule check applies a spacing requirement for the first gate structure and the second gate structure, wherein the spacing requirement requires a distance of separation of greater than - View Dependent Claims (11, 12, 13)
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14. An integrated circuit, comprising:
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a first gate structure having a first side of a first length (W) and a second side of a second length (L), the first length (W) being greater than the second length (L); a second gate structure spaced a distance from the first gate structure, wherein the distance is greater than (√
{square root over (W*W+L*L)})/10, wherein the second gate structure is the next adjacent gate structure to the first gate structure. - View Dependent Claims (15, 16, 17, 18, 19)
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Specification