Projectors of Structured Light
First Claim
Patent Images
1. Optical apparatus, comprising:
- a beam source, which is configured to generate an optical beam having a pattern imposed thereon;
a projection lens, which is configured to receive and project the optical beam so as to cast the pattern onto a first area in space having a first angular extent; and
a field multiplier, which is interposed between the projection lens and the first area and is configured to expand the projected optical beam so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent.
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Accused Products
Abstract
Optical apparatus includes a beam source, which is configured to generate an optical beam having a pattern imposed thereon. A projection lens is configured to receive and project the optical beam so as to cast the pattern onto a first area in space having a first angular extent. A field multiplier is interposed between the projection lens and the first area and is configured to expand the projected optical beam so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent.
173 Citations
42 Claims
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1. Optical apparatus, comprising:
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a beam source, which is configured to generate an optical beam having a pattern imposed thereon; a projection lens, which is configured to receive and project the optical beam so as to cast the pattern onto a first area in space having a first angular extent; and a field multiplier, which is interposed between the projection lens and the first area and is configured to expand the projected optical beam so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. An optoelectronic device, comprising:
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a semiconductor substrate; and a monolithic array of light-emitting elements, arranged on the substrate in a two-dimensional pattern that is not a regular lattice. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24)
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25. A method for pattern projection, comprising:
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generating an optical beam having a pattern imposed thereon; projecting the optical beam using a projection lens so as to cast the pattern onto a first area in space having a first angular extent; and applying a field multiplier to expand the optical beam projected by the projection lens so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent. - View Dependent Claims (26, 27, 28, 29, 30, 31, 32, 33)
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34. A method for producing an optoelectronic device, the method comprising:
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providing a semiconductor substrate; and forming a monolithic array of light-emitting elements on the substrate in a two-dimensional pattern that is not a regular lattice. - View Dependent Claims (35, 36, 37, 38, 39, 40, 41, 42)
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Specification