TENSILE STRAINED SEMICONDUCTOR PHOTON EMISSION AND DETECTION DEVICES AND INTEGRATED PHOTONICS SYSTEM
First Claim
Patent Images
1. An optical device comprising:
- a germanium region, the germanium region in contact with a plurality of stressor regions, the plurality of stressor regions inducing tensile strain within the germanium region, the tensile strain in at least a portion of the germanium region sufficient to cause the portion of the germanium region to have a direct band gap;
a junction positioned in or adjacent the portion of the germanium region, the junction having a first side with a first majority carrier type and a second side with a second majority carrier type; and
first and second contacts respectively coupled to the first side of the junction and the second side of the junction.
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Abstract
Tensile strained germanium is provided that can be sufficiently strained to provide a nearly direct band gap material or a direct band gap material. Compressively stressed or tensile stressed stressor materials in contact with germanium regions induce uniaxial or biaxial tensile strain in the germanium regions. Stressor materials may include silicon nitride or silicon germanium. The resulting strained germanium structure can be used to emit or detect photons including, for example, generating photons within a resonant cavity to provide a laser.
46 Citations
37 Claims
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1. An optical device comprising:
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a germanium region, the germanium region in contact with a plurality of stressor regions, the plurality of stressor regions inducing tensile strain within the germanium region, the tensile strain in at least a portion of the germanium region sufficient to cause the portion of the germanium region to have a direct band gap; a junction positioned in or adjacent the portion of the germanium region, the junction having a first side with a first majority carrier type and a second side with a second majority carrier type; and first and second contacts respectively coupled to the first side of the junction and the second side of the junction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. An optical device comprising:
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first and second germanium regions, the first germanium optically active region in contact with a first tensile stressor so that the first germanium region has biaxial tensile strain in at least a first portion of the first germanium region, the second germanium region in contact with a second tensile stressor so that the second germanium region has biaxial tensile strain in at least a second portion of the second germanium region; optical elements defining an optical path through the first and second germanium regions; a junction positioned in or adjacent the first and second portions of the first and second germanium regions, the junction having a first side with a first majority carrier type and a second side with a second majority carrier type; and first and second contacts respectively coupled to the first side of the junction and the second side of the junction. - View Dependent Claims (11, 12, 13, 14, 15, 16)
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17. An optical device comprising:
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a germanium slab having first and second faces and first and second ends; first and second stressor layers on the first and second faces, the first and second stressor layers inducing biaxial tensile stress within the germanium slab; and optical elements positioned with respect to the germanium slab to define an optical path passing through the germanium slab. - View Dependent Claims (18, 19, 20, 21)
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22. An optical device comprising:
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two or more germanium slabs each having first and second faces and first and second ends; first and second stressor layers on each of the first and second faces, the first and second stressor layers inducing biaxial tensile stress within respective ones of the two or more germanium slabs; and optical elements positioned with respect to the germanium slabs to define an optical path passing through the two or more germanium slabs. - View Dependent Claims (23, 24, 25, 26, 27)
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28. A method of making an optical device, comprising:
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providing a substrate having a germanium region; etching openings into the germanium region; and forming silicon germanium within the openings to form a pattern of embedded silicon germanium regions surrounding a first portion of the germanium region, and the first portion of the germanium region having in-plane biaxial tensile strain. - View Dependent Claims (29, 30, 31, 32, 33, 34)
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- 35. A method of communicating data, comprising coupling an electrical signal into a optical device comprising a first strained semiconductor region to generate a responsive optical signal, transmitting the responsive optical signal through a waveguide comprising a second unstrained semiconductor region and coupling the responsive optical signal into a detector comprising a third strained semiconductor region, wherein the first, second and third semiconductor regions comprise germanium.
Specification