METHODS FOR MANUFACTURING A METAL-OXIDE THIN FILM TRANSISTOR
First Claim
1. A method for manufacturing a metal-oxide thin film transistor, comprising:
- forming a gate electrode on a substrate;
forming a gate insulating layer over the gate electrode;
forming a metal-oxide semiconductor layer having a channel region on the gate insulating layer;
forming a source electrode and a drain electrode on the metal-oxide semiconductor layer, wherein the source electrode is spaced apart from the drain electrode by a gap exposing the channel region;
forming a mobility-enhancing layer on the channel region, wherein the mobility-enhancing layer is not in contact with the source electrode and the drain electrode;
annealing the metal-oxide semiconductor layer and the mobility-enhancing layer in an environment at a temperature of about 200°
C. to 350°
C.
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Accused Products
Abstract
Disclosed herein is a method for manufacturing a metal-oxide thin film transistor. The method includes the steps of: (a1) forming a gate electrode on a substrate; (a2) forming a gate insulating layer over the gate electrode; (a3) forming a metal-oxide semiconductor layer having a channel region on the gate insulating layer; (a4) forming a source electrode and a drain electrode on the metal-oxide semiconductor layer, wherein the source electrode is spaced apart from the drain electrode by a gap exposing the channel region; (a5) forming a mobility-enhancing layer on the channel region, wherein the mobility-enhancing layer is not in contact with the source electrode and the drain electrode; and (a6) annealing the metal-oxide semiconductor layer and the mobility-enhancing layer in an environment at a temperature of about 200° C. to 350° C.
6 Citations
16 Claims
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1. A method for manufacturing a metal-oxide thin film transistor, comprising:
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forming a gate electrode on a substrate; forming a gate insulating layer over the gate electrode; forming a metal-oxide semiconductor layer having a channel region on the gate insulating layer; forming a source electrode and a drain electrode on the metal-oxide semiconductor layer, wherein the source electrode is spaced apart from the drain electrode by a gap exposing the channel region; forming a mobility-enhancing layer on the channel region, wherein the mobility-enhancing layer is not in contact with the source electrode and the drain electrode; annealing the metal-oxide semiconductor layer and the mobility-enhancing layer in an environment at a temperature of about 200°
C. to 350°
C. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method for manufacturing a metal-oxide thin film transistor, comprising:
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forming a gate electrode on a substrate; forming a gate insulating layer over the gate electrode; forming a metal-oxide semiconductor layer having a channel region on the gate insulating layer; forming a source electrode and a drain electrode on the metal-oxide semiconductor layer, wherein the source electrode is spaced apart from the drain electrode by a gap exposing the channel region; treating a surface of the channel region of the metal-oxide semiconductor layer by using a mobility-enhancing medium; and annealing the treated metal-oxide semiconductor layer in an environment at a temperature of about 200°
C. to 350°
C. - View Dependent Claims (12, 13, 14, 15, 16)
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Specification